A new technology for chemical polishing of copper in weak alkaline solution has been developed and a brightener (containing corrosion inhibitor and surfactant) has been found out.

• 开发出了弱碱性溶液中紫铜化学抛光新工艺，确定了抛光液中的光亮剂（包括缓蚀剂和表面活性剂）。