Boron carbon nitride (BCN) films were deposited onto silicon substrates by medium frequency magnetron sputtering from graphite and boron targets with feedstock of nitrogen and argon.

• 采用中频磁控溅射技术,使用N2和Ar混合气体作为反应气体,分别溅射硼靶和石墨靶,在单晶硅衬底上制备了BCN薄膜。