Chemical vapor deposition of hard diamond-like carbon (DLC) films was achieved using an inductively coupled plasma source (ICPS).

• 本文采用感应耦合等离子体源(ICPS)成功地实现化学气相沉积硬质类金刚石(DLC)膜,并考察了基片负偏压对类金刚石膜沉积过程和薄膜性质的影响。