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- The main work includes: 1.Large area high quality freestanding diamond thick films have been prepared by DC arc plasma jet CVD apparatus. 所完成的主要工作包括:1.;采用直流电弧等离子体喷射法沉积了较大面积的高质量金刚石自支撑厚膜;
- Nanocrystalline free-standing diamond films were deposited by 30kW DC Arc Plasma Jet CVD method on Molybdenum substrate with mixed fed gasses of Argon, Hydrogen and Methane. 在30kW级DC Arc Plasma Jet CVD(直流电弧等离子体喷射化学气相沉积)设备上,采用Ar-H2-CH4混合气体,在Mo的衬底上沉积出纳米金刚石自支撑膜。
- Effects of nitrogen addition on dielectric properties of DC arc plasma jet CVD diamond films 金刚石膜介电性能影响因素的研究
- Study of surface morphology of DC Arc Plasma Jet CVD free-standing diamond films 自支撑金刚石膜表面形貌的研究
- Effects of Nitrogen Addition on Growth, Morphology and Quality of DC Arc Plasma Jet CVD Diamond 加氮对直流电弧等离子体喷射金刚石膜生长、形貌和质量的影响
- Effects of Nitrogen Addition on Microstructure and Fracture Strength of DC Arc Plasma Jet CVD Diamond Films 加氮对直流电弧等离子体喷射金刚石膜显微组织和断裂强度的影响
- Analysis of Residual Stress Distribution in DC Arc Plasma Jet CVD High Quality Diamond Films by Raman Spectroscopy 直流电弧等离子体喷射化学气相沉积高质量金刚石膜残余应力分布的拉曼谱分析(英文)
- Keywords DC arc plasma jet CVD;free-standing diamond films;multilayered structure;internal stress; 直流电弧等离子喷射化学气相沉积;自支撑金刚石膜;多层结构;内应力;
- DC arc plasma jet CVD 直流电弧等离子喷射化学气相沉积
- Diamond film produced DC arc plasma jet is measured by force driven static measuring ultra micr indentation system UMIS 2000.The result shows that hardness of diamond film is related to not only crystal growth direction but also thickness. 使用力驱动静态超微压痕测量仪器（Force Driven Static Measuring Ultra Micro－ Inden－tation System ）－ UMIS－ 2000 对由直流等离子体喷射法沉积的金刚石膜进行测量。 结果显示金刚石膜的硬度不仅与晶体生长方向和晶粒大小有关，还与厚度有关。
- CARBON FILMS PREPARED BY D. C. ARC PLASMA JET CVD 直流电弧等离子体射流CVD制备多种碳膜
- 4.Diamond film produced DC arc plasma jet is measured by force driven static measuring ultra micr indentation system UMIS 2000. 使用力驱动静态超微压痕测量仪器（ForceDrivenStaticMeasuringUltraMicro-Inden-tationSystem）-UMIS-2000对由直流等离子体喷射法沉积的金刚石膜进行测量。
- Diamond films were deposited by means of the high current extended DC arc plasma CVD technique. 并在浸蚀过的硬质合金衬底上,用强电流直流伸展电弧等离子体CVD法沉积金刚石涂层。
- DC arc plasma jet method 直流电弧等离子喷射法
- DC arc plasma jet 直流电弧等离子体喷射
- The pure nickel nanopowders were prepared by DC arc plasma evaporation method using self-designed and fabricated experimental apparatus. 采用自行研制的试验装置,用直流电弧等离子体蒸发法制备了高纯度的纳米镍粉。
- STUDY ON DIAMOND FILMS SYNTHESIZED BY DC PLASMA JET CVD 直流等离子射流CVD法合成金刚石膜的研究
- STUDY ON PREPARATION of AlN POWDER by DC ARC PLASMA 等离子法制备氮化铝粉末原料的研究
- High current extended DC arc plasma 强电流直流扩展弧
- DC-arc plasma jet CVD 直流电弧等离子体喷射化学气相沉积
