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We used DC arc discharge to synthesize carbon nanotubes. 在本论文中我们研究利用网印的技术来制做场发射显示器。
DC arc discharge plasma chemical vapor deposition 直流弧光放电等离子体CVD
CRYSTAL MORPHOLOGY AND FEATURE OF THE DIAMOND FILMS BY DC ARC DISCHARGE 直流弧光放电等离子体CVD金刚石薄膜中的晶体类型与特征
Fluorination Reaction Under Ar-O2 Controlled Atmosphere DC Arc Discharge 氩氧控制气氛下直流电弧放电中氟化反应
Effect of Some Spectroscopic Buffers on Transite Time of Cu and Cr Atoms in DC Arc Discharge 直流电弧中若干缓冲剂对Cu及Cr原子停留时间的影响
DC arc discharge 直流电弧放电
In this paper, preparing nanocrystalline carbon nitride thin films has been investigated by using Arc Discharge and dc Hollow Cathode Discharge (HCD). 本文主要论述了采用弧光放电(Arc Discharge)和直流空心阴极放电(DC Hollow Cathode Discharge)两种方法来制备纳米陶瓷氮化碳薄膜。
SCR rectifier is the same as that of DC arc wilding generator. 从而使可控硅整流焊机的电弧穿透力与直流旋转焊机相当。
Fluorescent is a low pressure mercury-smoke arc discharge lamp. 日光灯是一种低气压的汞蒸气弧光放电灯。
The power source has such performances as lift starting, DC arc welding, pulse welding, gas preflow, gas postflow, etc. 该电源具有提升引弧、直流焊、脉冲焊、提前送气和延时断气等功能。
Diamond films were deposited by means of the high current extended DC arc plasma CVD technique. 并在浸蚀过的硬质合金衬底上,用强电流直流伸展电弧等离子体CVD法沉积金刚石涂层。
The effect of second anode action on the cathode vacuum arc discharge stability in the cathode arc deposition technology is studied. 研究了阴极弧等离子体沉积中第二阳极现象改善弧放电稳定性的作用。
The control of arc deflection in DC arc steelmaking furnace is key topic of deveioping DC arcfurnace in China. 解决直流电弧炉的偏弧问题是发展我国直流电弧炉的一项关键技术。
Arc Discharge Influence on Output Characteristic of Gas Laser Resonator for Multi-pair Electrodes. 弧光放电对多电极对气体激光器输出特性的影响
SWCNTs are produced by three main techniques: arc discharge, laser ablation and chemical vapor deposition (CVD). SWCNTs的制备方法很多，包括电弧放电法、激光蒸发法、化学气相沉积法(Chemical Vapor Deposition，CVD)等。
The pure nickel nanopowders were prepared by DC arc plasma evaporation method using self-designed and fabricated experimental apparatus. 采用自行研制的试验装置,用直流电弧等离子体蒸发法制备了高纯度的纳米镍粉。
Multi-arc ion plating technique is using cool cathode with self-maintaining arc discharge as evaporation source. 多弧离子镀技术是一种在真空中将冷阴极自持弧光放电用于蒸发源的镀膜技术。
The main work includes: 1.Large area high quality freestanding diamond thick films have been prepared by DC arc plasma jet CVD apparatus. 所完成的主要工作包括:1.;采用直流电弧等离子体喷射法沉积了较大面积的高质量金刚石自支撑厚膜;
N-doped carbon coated Fe,Co,Ni nanocrystals were prepared by an AC arc discharge method under nitrogen buffer gas. 采用交流电弧法;在氮气氛下合成了氮杂碳包金属Fe、Co、Ni纳米晶.
Low energy ions were produced in gas arc discharge,and the ions were accelerated into tyrosine(Tyr) aqueous solution. 分别以注入机和气体常压弧光放电产生的低能离子作用于固态和溶液中的氨基酸，研究了样品红外光谱的变化。