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High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature. 摘要本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
Nanocrystallized 309 stainless steel coating has been fabricated on glass substrate by DC magnetron sputtering. 用动电位极化、恒电位极化及交流阻抗技术研究了309不锈钢及其溅射纳米涂层在0。
Abstract: The vanadium oxide thin films have been prepared by DC magnetron sputtering. 摘要：本文用直流磁控溅射法来制备氧化钒薄膜。
Indium tin oxide(ITO) films were deposited by DC magnetron sputtering system in different deposition pressures and V(Ar):V(O2) gas mixtures. 用直流磁控溅射系统在不同气压和氩氧流量比(V(Ar):V(O2),体积比)下制备铟锡氧化物(ITO)薄膜。
Aluminum nitride (AIN) thin films have been successfully deposited on Si(100) and Pt/Ti/Si(100) by DC magnetron reactive sputtering. 采用直流磁控反应溅射法,在Si(100)和Pt/Ti/St(100)上制备了具有较好(002)择优取向性的AlN薄膜。
Binder is used to coat on the fabric that is prepared by DC magnetron sputtering to improve the combine fastness of aluminum layer. 摘要直流磁控溅射镀铝织物金属层牢度较差，文章采用在镀铝织物表面涂层粘合剂的方法来改善织物牢度。
High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at room temperature. 本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
Using Ternary alloy NiFeNb as a new seed layer, the (Ni_(82)Fe_(18))_(1-x)Nb_x(t nm)/Ni_(82)Fe_(18)(d nm)/Ta(3 nm) films are prepared with a DC magnetron sputtering system. 以三元合金NiFeNb作新种子层;采用直流磁控多靶设备制备了具有不同Nb含量(x)、NiFeNb厚度(t)和坡莫合金厚度(d)的纳米级(Ni82Fe18)1-xNbx(tnm)/Ni82Fe18(dnm)/Ta(3nm)坡莫合金系列膜.
IrMn top spin valves,with a structure of Ta/NiFe/CoFe/Cu/CoFe/IrMn/Ta,were deposited on glass and silicon substrate by high vacuum DC magnetron sputtering. 在玻璃和硅衬底上利用高真空直流磁控溅射的方法淀积了结构为Ta/NiFe/CoFe/Cu/CoFe/IrMn/Ta的IrMn顶钉扎自旋阀薄膜。分别研究了增加磁电阻率,降低矫顽力和提高交换场的方法。
The Nb/Al-AlOx/Nb all-niobium tunnel junctions were fabricated by dc magnetron sputtering, with selective niobium etching process and selective niobium anodiza-tion process. 用磁控溅射方法及选择铌阳极氧化和选择铌刻蚀工艺制备了Nb/Al-AlO_x/Nb全铌隧道结,给出了工艺要点。
Stellite coatings were deposited on stainless steel 2Crl3 by DC magnetron sputtering and then were melted by electron beam. Corrosion resistances in 0.5M H2SQ4 and 0.1M NaCl solution were investigated by means of electrochemical technique. 在不锈钢2Cr13表面;用直流磁控溅射沉积;经电子束熔凝处理;获得司太立合金复层;利用电化学技术研究了在0.;5M硫酸和0
Aluminum-doped zinc oxide (ZAO) ceramic targets for sputtering were fabricated by hot isostatic pressing (HIP) and ZAO transparent conducting thin films were prepared by dc magnetron sputtering. 用热等静压法烧结制备了高导电性ZAO(铝掺杂氧化锌)陶瓷靶材,并用直流磁控溅射法制备出ZAO透明导电薄膜。
DC magnetron sputtering technology 直流磁控溅射
DC magnetron reactive sputtering 直流磁控溅射
A STUDY OF (Ti,Al)N HARD FILMS BY DC MAGNETRON SPUTTERING 直流磁控溅射(Ti、Al)N硬化膜的研制
A numerical calculation of planar DC magnetron discharge with Particle-in-Cell/Monte Carlo Collision method is performed using the magnetic field related to a real magnetron target. 当设计磁控靶表面的磁场一定时，根据计算得到的磁极表面的磁场强度能够得出需要采用磁性材料的强度。
Application of DC Magnetron Sputtering Coating in the Glass Coating Technique 直流磁控溅射镀膜在玻璃涂层技术中的应用
Kinetic Scaling of Iron Nitride Thin Films Deposited by DC Magnetron Sputtering 直流磁控溅射氮化铁薄膜生长的动力学标度
Chiyoda Mutual Life Insurance Co. 千代田寿险公司(日本)
In this study , Poly-crystal ZnO films have been grown by RF magnetron sputtering technique and were investigated the CO gas sensing properties . 中文摘要本论文主要以射频磁控溅镀法，探讨氧化锌薄膜对于有毒气体一氧化碳(CO)的感测特性。