DLC and fluorinated DLC were deposited by enclosed unbalanced magnetron sputtering using C 2H 2 as a reactive gas and C 2F 2 as a fluorine source gas.

• 使用非平衡磁控溅射方法，以C2H2为反应气，C2F2为氟化气沉积了含氟和不含氟的类金刚石（DLC）薄膜。