Finally, a favorable BARC (bottom-anti-reflected-coating) etch profile to reduce fencing defect is achieved through plasma parameter optimization based on model results.

• 模型和实验的结果表明:通过对等离子体刻蚀参数的优化可以产生一个能减少底部防反光层的围墙式缺陷的刻蚀剖面。