In this paper, CIO thin film was prepared by DC reactive magnetron sputtering method in JGP450 type high vacuum magnetron sputtering apparatus, the surface morphology and structure of the CIO thin film were analyzed by AFM, XRD and XPS.

• 本文在JGP450型高真空磁控溅射台上,采用直流反应磁控溅射法制备了CIO薄膜,用AFM、XRD和XPS分析了样品的表面形貌、组织结构、化学态和元素价态。