In this thesis, by using the Si electron beam evaporator (EBE) and UHV MBE system which are developed and set up by ourselves, a flat and crystalline Si epitaxial film has been obtained on Si substrate.

• 本论文利用自主研发的Si电子束蒸发器和建立的分子束外延设备，在Si衬底上外延生长出了表面平整的Si单晶薄膜。