您要查找的是不是：
- Effect of Ion Beam Flux Density and the Temperature of Substrate on Properties of the TiN Nano-films 离子束流密度和基底温度对TiN纳米薄膜性能的影响
- density of ion beam flux 离子束流密度
- Ion beam flux 离子束流
- It is a technique called ion beam writing. 这一技术被称为离子束刻写。
- Ion beam mutation has significant bio-effect. 摘要离子诱变具有显著的生物学效应。
- The 6 achievements on Ion Beam Bio-engineering of Low Energy were outlined. 摘要简述了低能离子束生物技术在6个主要方面的研究成果。
- Ion beam induced surface modification of polymer was extensively discussed. 介绍了运用高能离子束对聚合物材料进行表面改性的新工艺。
- And the thickness can be confined from several nanometers to nanometer multilayer membrane because of our beam flux integral equipment. 由于我们有束流积分设备,可控制膜厚在纳米量级到纳米多层膜。
- Allison scanner for high-current ion beam emittance measurements[J]. 引用该论文 徐蓉;邹宇斌;高淑丽;郭之虞;彭士香;钱锋;赵捷.
- The fundamental equations of the HPM propagation in the atmosphere under the beam flux one-dimension assumption are given. 给出了束流1维近似下微波大气传输的基本方程组。
- Antireflective film prepared by periodic ion beam assisted deposition[J]. 引用该论文 张大伟;黄元申;贺洪波;邵建达;范正修.
- Local time about 10:25, the scientific researchers announced that the first bunch of proton beam flux has passed through the entire large-scale hadron collider. 当地时间10时25分左右，科研人员宣布第一束质子束流贯穿了整个大型强子对撞机。
- high flux electron beam and ion beam 强流电子束和离子束
- High flux electron beamand ion beam 强流电子束和离子束
- Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam. 以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
- In addition, average angular information is taken from adjacent segments and the incident ion beam. 另外，可以从邻近线段和入射离子束取得平均角度的信息。
- The system of ion beam implantation had been established and the biological effects were primarily studied. 壮观链霉菌1043为一壮观霉素生产菌种，通过实验建立了离子注入选育壮观链霉菌。
- Streptomyces spectabilis 1043 which produces spectinomycin is implanted by N(superscript +) ion beam. 摘要利用离子注入选育高产壮观链霉菌。
- Ensinger W.Ion Source for ion beam assisted thin film deposition[J].Rev.Sci.-Instrum.1992,63(11):5217. 潘永强;朱昌;陈智利;等.;端部霍尔离子源工作特性及等离子体特性研究[J]
- We used Ebeam lithography to define the photonic crystal patterns and ion beam etcher for the etching process. 元件制作方面，我们使用电子束微影系统来定义光子晶体的图形，并用离子束蚀刻机进行蚀刻制程。
