OPC (Optical Proximity Correction) has developed to be a part of EDA framework, which is primarily used to increase the achievable resolution and pattern transfer fidelity.

• 光学邻近效应修正(Optical Proximity Correction，OPC)已成为半导体制造不可缺少的技术，同时发展为电子设计自动化(Electronic Design Automation，EDA)框架中的重要组成部分。