So, it could be suggested that the thermal treatment is an effective way to minimize residual ions, and reduce haze issues when the photomask using in 193nm stepper or scanner.

• 通过在传统光掩模清洗后引入加热处理和热去离子水的冲洗，可以有效减少光掩模表面离子残留，从而防止和减少光掩模在193nm波长光刻应用中生成雾状缺陷(haze)。