The demands on the broad ion sources for material modification are described. The kaufman gas ion sources and the Electron beam evaporation metal ion source (EBE) of high current are emphasised. The RF, ECR, as well as MEVVA sources are also introduced.

• 本文叙述了对材料表面改性的宽束离子源的要求，重点介绍了考夫曼型气体离子源及电子束蒸发强流金属离子源，也介绍了RF、ECR离子源及MEVVA源。