The high quality DLC films were successfully deposited on the surface of silicon substrates at room temperature by the filtered cathodic arc plasma(FCAP) equipment.

• 利用自行研制的磁过滤等离子体技术(FCAP),并创造性地对衬底施加低频率周期性负偏压,在室温下的单晶硅表面上制备了高质量的非晶金刚石薄膜。