The modified formula can be used to simplify the design and simulation for integrated photonic devices such as arrayed waveguide grating (AWG) and etched diffraction grating (EDG).
英
美
- 把这种修正方法应用到平面光集成波导器件,如阵列波导光栅(AWG)、蚀刻衍射光栅(EDG)等器件的设计和模拟中,可以大大降低工作的复杂性,同时可以得到精确的结果。