The optimum method for preparing TiNi thin films is magnetron sputtering (the parameter is: electrical current 0.6 A, vacuum 0.6 Pa, Ar flux 25 SCCM ).

• 在本实验条件下优选出来的制膜方法为磁控溅射法；工艺参数为溅射电流0.；6 A；真空度0