The results of EPMA showed that the metallicfllms deposited on the metallic substates by the magnetron sputtering ion plating process are the mixed filmswhich consist of the elements of the target and the substrate.

• 电子探针分析表明,金属基体磁控溅射离子镀金属膜是靶材元素和基材元素组成的混合膜。