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- The effect of second anode action on the cathode vacuum arc discharge stability in the cathode arc deposition technology is studied. 研究了阴极弧等离子体沉积中第二阳极现象改善弧放电稳定性的作用。
- The second anode action of the filtering duct and the equivalent circuit of the filtered cathode vacuum arc discharge 磁过滤真空弧沉积中过滤管道的第二阳极作用研究
- EFFECTS OF FILTER DUCT MAGNETIC FIELD ON ARC DISCHARGE AND PLASMA TRANSPORTATION IN A MODIFIED VACUUM ARC DEPOSITION APPARATUS 过滤管道磁场对改进弧沉积系统弧放电和传输效率的影响
- RCAE1047 will be stable in arc discharge at higher vacuum condition and lower arc current, especially for pure Zr target. 1047可以在高真空和低电流条件下稳定弧光放电工作,特别是采用纯锆靶材时。
- Fluorescent is a low pressure mercury-smoke arc discharge lamp. 日光灯是一种低气压的汞蒸气弧光放电灯。
- We used DC arc discharge to synthesize carbon nanotubes. 在本论文中我们研究利用网印的技术来制做场发射显示器。
- Arc slag remelting (ASR) of the ESR absorption and the advantages of vacuum arc remelting. 弧渣重熔(ASR)吸收了电渣重熔和真空电弧重熔的优点。
- Boxman, R. L., Sanders D., Martin P. J., Handbook of Vacuum Arc Science and Technology,(1995). 林建宏,磁控溅射沈积铬基硬质镀膜高温氧化与机械性质研究,中兴大学硕士论文,(1998)。
- Direct current metal filtered cathodic vacuum arc(FCVA) and acetylene gas(C_2H_2) are wielded to synthesize amorphous carbon films on Si(100). 采用直流金属磁过滤阴极真空弧(FCVA)制造出Ti和乙炔(C2H2)气体的双等离子体在单晶硅(100)上制备非晶态碳膜.
- Arc Discharge Influence on Output Characteristic of Gas Laser Resonator for Multi-pair Electrodes. 弧光放电对多电极对气体激光器输出特性的影响
- The forces applied on the molten pool at the cathode surface under the action of an ex-ternal magnetic field during vacuum arc coating are analyzed. 分析了在外加磁场作用下,真空电弧镀膜中阴极靶面液池的受力情况,导出了液滴喷溅特性受磁场影响的关系式。
- SWCNTs are produced by three main techniques: arc discharge, laser ablation and chemical vapor deposition (CVD). SWCNTs的制备方法很多,包括电弧放电法、激光蒸发法、化学气相沉积法(Chemical Vapor Deposition,CVD)等。
- For subsonic state (ion) high current vacuum arc, with the increase of electrode separations, the loss of interelectrode plasma increases. 对于离子处于亚音速状态的大电流真空电弧,随着开距的增大,极间等离子体的损失增多。
- Multi-arc ion plating technique is using cool cathode with self-maintaining arc discharge as evaporation source. 多弧离子镀技术是一种在真空中将冷阴极自持弧光放电用于蒸发源的镀膜技术。
- Finally the principle is studied on how the diameter of shield influences vacuum arc voltage,shield voltage and shield current. 最后研究了屏蔽罩大小对真空灭弧室电弧电压、屏蔽罩电位及屏蔽罩电流的影响。
- N-doped carbon coated Fe,Co,Ni nanocrystals were prepared by an AC arc discharge method under nitrogen buffer gas. 采用交流电弧法;在氮气氛下合成了氮杂碳包金属Fe、Co、Ni纳米晶.
- Amorphous diamond(a-D) films deposited by filtered cathodic vacuum arc(FCVA) technology with different substrate bias were investigated. 采用过滤阴极真空电弧技术,通过施加不同衬底偏压制备了非晶金刚石薄膜。
- Low energy ions were produced in gas arc discharge,and the ions were accelerated into tyrosine(Tyr) aqueous solution. 分别以注入机和气体常压弧光放电产生的低能离子作用于固态和溶液中的氨基酸, 研究了样品红外光谱的变化。
- A method,degrading highly concentrated organic wastewater by gas-liquid phase gliding arc discharge,is introduced. 介绍了一种气液两相滑动弧放电等离子体处理高浓度有机废水的新方法。
- Base on this, in this work we prepared in situ TiC or (TiB+TiC)/Ti-1100 composites with various volume fraction of reinforcements by the consumable vacuum arc melting. 主要研究结果如下:在所制备的原位自生(TiB+TiC)或TiC/ Ti-1100复合材料中,增强体TiB、TiC分布均匀,与基体界面洁净,没有明显反应层存在。