a C:F thin films are deposited by microwave electron cyclotron resonance plasma chemical vapor deposition(ECR CVD)using CF 4 and C 6H 6 as source gases.

• 用苯 (C6H6)和四氟甲烷 (CF4 )混合气体作源气体 ,用微波电子回旋共振等离子体化学气相沉积技术制备了含氟非晶碳膜 (a C :F)。