您要查找的是不是：
- THE RESEARCH OF REACTION ION ETCHING AND ION ETCHING METHODS 反应离子刻蚀与离子刻蚀方法的研究与比较
- The reactor is capable of working in the RIE (reactive ion etching) mode and also in the plasma etching mode. 反应腔拥有在RIE(反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。
- Yak hairs were treated by the microwave electron cyclotron resonance plasma reactive ion etching (ECR-RIE) equipment to improve its property of weave. 摘要采用微波电子回旋共振等离子体反应离子刻蚀(ECR-RIE)装置对牦牛毛纤维进行表面改性，从而改善牦牛毛的可纺性。
- The experiment of fully automatic reactive ion etching on 3 inch GaAs wafer is described. 介绍了全自动反应离子腐蚀3英寸GaAs片的实验研究工作。
- A patterned DLC thin film cath ode was fabricated by reactive -ion etching method and mic ro -fabrication technology. 通过离子束技术和微细加工技术可以实现DLC薄膜的图形化并能大大提高薄膜的场发射性能。
- The arrays were subsequently treated with reactive ion etching (RIE) to slightly reduced the size of the sphere. 制程的开发首先利用黄光微影制作有高低差的沟槽图样，再将单层奈米球排入沟槽之中。
- It indicates that the plasma-assisted etching method is very valid to fabricate deep grating. 通过等离子体辅助刻蚀技术制作出了立方状亚波长抗反射光栅。
- The ice etching method was adapted to duplicate the form of grains in microvilli membrane. 采用冰冻蚀刻法复制微绒毛膜膜内粒子形态。
- Reactive ion etching (RIE) process utilized to form giant magnetoresistive (GMR) spin valve sensing elements was investigated experimentally. 对巨磁电阻自旋阀磁场传感器制作中的关键技术之一:自旋阀薄膜的反应离子刻蚀(RIE)工艺,进行了试验研究。
- This paper describes a new crosshatching technology on PI flexible substrate, using chemically etching method. 本文介绍一种在挠性聚酰亚胺基材上开窗口的新工艺。
- Yak hairs were treated by the microwave electron cy cl otron resonance plasma reactive ion etching(ECR-RIE) equipment to improve its property of weave. 采用微波电子回旋共振等离子体反应离子刻蚀(ECR-RIE)装置对牦牛毛纤维进行表面改性,从而改善牦牛毛的可纺性。
- Austenite grain size of plain carbon steel and alloy steel were examined by oxidization and grain boundary etching method. 采用氧化法和晶粒边界腐蚀法对几种不同的碳钢和合金钢的奥氏体晶粒的显示进行了对比试验。
- In the table below, if a blaze wavelength is indicated, the grating has been optimized for the indicated wavelength and has been blazed by means of ion etching. 下表中标有闪耀波长的光栅为离子刻蚀光栅,在闪耀波长处优化。
- This research is base on the recent technology of grinding process, and then apply the batch etching method to improve the wafer thining. 本研究建立在现行轮磨可达到的薄化基础上，以批次式蚀刻方式将矽晶圆做更进一步的薄化。
- A two-dimensional (2D) physical model of reactive ion etching (RIE) which includes isotropic and anisotropic components is presented.The physical model is analyzed. 摘要反应离子刻蚀(RIE)的二维物理模型，包括各向同性和各向异性两部分。
- The chemical etching method wa applied to form surface texture of multicrystalline silicon in order to reduce the reflectance of the surface. 为了降低光在多晶硅表面的反射,采用化学腐蚀法在其表面制备了绒面。
- The influence of chamber pressure,gas flow rate and RF power on micro loading effect in reactive ion etch of silicon dioxide is researched. 结果表明,通过对反应室压力、刻蚀气体流量和射频功率的调节,可以降低微负载效应的影响,得到良好的刻蚀均匀性。
- We found that the mole ratio of the raw materials, gelling temperature, carbonization temperature and etching method could effect the pore structures of the porous carbons. 研究发现，影响多孔炭孔结构的主要因素是原料的摩尔比，另外还与胶凝温度、炭化温度、刻蚀方式有关。
- We found that the mole ratio of the raw materials,gelling temperature,carbonization temperature and etching method could effect the pore structure of the porous carbons. 研究发现,影响多孔炭孔结构的主要因素是原料的摩尔比,另外还与胶凝温度、炭化温度、刻蚀方式有关。
- With the aid of a water-heater controllable in both temperature and time, the chemical etching method adding a bit hydrofluoric acid and xylene in traditional picric acid sa... 结果表明:利用控温控时水浴锅采用传统饱和苦味酸滴加微量氢氟酸和二甲苯的试剂可清晰显示不同状态下的奥氏体晶界。
