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- The coating is deposited on thin quartz crystal sheet with double ion beam sputter technique, the measuring results show that the spectral character and image quality are perfect. 采用双离子束溅射技术在石英晶体薄片上淀积了该膜系，经测试，光谱特性满足设计要求，成像效果理想。
- ion beam sputtering technique 离子束溅射
- The review ofour work includes: ion implanted contact, ion beam sputtering diposition hardfilm on beryllium and lubricate film on steel and so on. 即离子注入、子束混合、种离子束淀积等技术的研究和应用。
- D. T. Wei, H. R. Kaufman and C. C. Lee, “Ion Beam Sputtering” Chapter of “Thin Films for Optical systems” Ed. By F. R. Flory, Marcel Decker Inc.(1995). ISBN 0-8247-9633-0 . 卫泰宇;李正中;“光学薄膜制镀技术及应用”;国科会光电小组;光电科技资料丛书之二十七;(1998年10月).
- C.C.Lee, Kie-Pin Chuang and Jean-Yee Wu “Thickness distribution of thin films deposited by ion beam sputtering”, Opt. Interference Coating, 8th Topical meeting, July 15-20, Mb8, (2001), Banff, Canada. 邱焕评、叶礼维、吴骏逸、李正中;“离子束能量对于光学薄膜沉积厚度分布之研究”;中华民国真空科技学会2001年会;12月15-16日(2001).
- C.C.Lee, C.J.Tang, J.C.Hsu and J.Y.Wu, ‘‘Rugate filter made with composite thin film by ion beam sputtering,” Opt.Interference Coating, 9th Topical meeting, June 27-July 2, Mc8, (2004), Tucson, USA. 吴骏逸、唐谦仁、李正中;“离子溅镀与电子枪蒸镀方法所得光学薄膜之比较;”中华民国真空科技学会2002年会;11月29-30日;新竹(2002).
- Production of Optical Coatings with Ion Beam Sputter Deposition Technique 离子束溅射沉积干涉光学薄膜技术
- The Summarize of Ion Beam Sputtering Technology 离子束溅射沉积薄膜技术概述
- CUBIC C-N COMPOUND PREPARED BY ION BEAM SPUTTERING 离子束溅射制备立方C-N化合物
- Dual ion beam sputtering deposition 双离子束溅射沉积
- The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced. 介绍了气相中晶体生长的方法,如辉光放电溅射法和离子束溅射沉积法以及晶体外延生长的方法。
- Experimental results show that the ion beam sputtered film is more stable than the electron gun evaporated film. 实验结果显示：离子束溅射膜的性能比电子枪蒸发膜更为稳定；
- Structures and Properties of ZnO Films Grown by Ion Beam Sputtering 离子束反应溅射ZnO薄膜的晶体结构及光学、电学性质研究
- Studies of Teflon Films Grown by Ion Beam Sputtering 离子束溅射作用下聚四氟乙烯薄膜的制备方法
- Investigation of Focused Ion Beam Sputtering Etching and Enhanced Etching 聚焦离子束溅射刻蚀与增强刻蚀的性能研究
- It is a technique called ion beam writing. 这一技术被称为离子束刻写。
- Structure Analysis of DLC Films Preparedby Dual Ion Beam Sputtering Method 双离子束溅射淀积DLC膜的结构分析
- Influence of Nitrogen Partial Pressure on NiCr Thin Films Prepared by Ion Beam Sputtering 氮分压对离子束溅射镍铬合金薄膜的影响
- Property comparison of optical thin films prepared by E-beam, ion assisted deposition and ion beam sputtering 电子束、离子辅助和离子束溅射三种工艺对光学薄膜性能的影响
- The ion gold mixing plating is multi arc ion plating combining with magnetron sputtering technique and is mainly used in gold plating to replace the commonly used but harmful nickel plating. 离子掺金镀是多弧离子镀与磁控溅射有机复合技术，主要用于离子镀金代替目前盛行而危害人体健康的闪镍工艺。
