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- ion sputter deposition 溅射蒸涂
- We have already noted on several occasions in the past two chapitres that ion bombardement of films during sputter deposition is particularly effectif in modifying film properties. 在前两章中，大家应该已经几次注意到，在溅射沉积过程中，离子束对表面的轰击可以有效地实现对膜进行改性。
- ion sputtering deposition 离子束溅射淀积
- Argon ion sputter rates of SiO_2 standards were determined by PHI600 Scanning Auger Microprobe(PERKIN-ELMER). 用PHI600型扫描俄歇探针对二氧化硅标样测定了氩离子对二氧化硅的溅射速率。
- Vacuum sputter deposition techniques were developed to achieve high Hc , with high Ms materials epitaxially grown on Cr underlayers. 使用真空溅射方法在Cr底层上沉积高矫顽力、高饱和磁化强度的磁记录介质。
- YE Zhi-zhen.The technology of magnetron sputter deposition and it's application in material science[J].Mater Scien Engineering 1989,7(1):26-32. [6]叶志镇.;磁控溅射技术及其在材料科学中的应用[J]
- With the simulation of sputter deposition, we can study how variables affect the film structures and understand the structural evolution which can t be observed in experiments. 藉由电脑模拟薄膜制程，将可研究不同参数对于薄膜结构的影响与瞭解实验中所无法观察到的薄膜沈积型态演化过程。
- Alloy and/or mixture of alloy and pure metal were formed by both the sequential sputter deposition, and blending metal nanoparticles followed by annealing in vacuum. 实验结果证实不论使用依序溅镀或真空热退火处理混合不同金属奈米粒子的离子溶液，其双金属奈米粒子结构皆呈现合金或是部分合金与部分纯金属的结构。
- S. B. Krupanidhi and M. Sayer,”Position and Pressure Effects in RF Magnetron Reactive Sputter Deposition of Piezoelectric Zinc Oxide” ,J.Appl.Phys.,vol. 56,pp. 3308,1984. 魏清梁，固态微型谐振器之压电层与反射层研制，国立中山大学电机工程研究所，硕士论文，2005.
- And other PVD methods, such as sputtering deposition, ion beam assisted deposition, and pulsed laser deposition, are also used to prepare BCN thin films. 同时，各种PVD方法也被用来制备硼碳氮薄膜，如溅射法、离子束辅助沉积和脉冲激光沉积等。
- Strong understanding of PVD sputter deposition hardware and ability to install, troubleshoot and perform preventative, corrective, minor and major repairs and upgrades in support of tool uptime requirements. 对PVD电镀沉淀硬件有很强的理解能力,按照工具升级需要进行安装、故障排除和实施预防性的、纠正性的主次要维修和升级。
- Production of Optical Coatings with Ion Beam Sputter Deposition Technique 离子束溅射沉积干涉光学薄膜技术
- Ion sputtering yields on T? Ti target are numerically calculated with TRIM program. 应用trim程序模拟了离子在氚钛靶上的溅射产额。
- The surface phenomena of Pb_(97.4)Sn2.4 alloy under the Ar+ ion sputtering have been investigated using PHI-590 scanning Auger microprobe at room temperature. 本文对Pb_(97.;4)Sn_(2
- Dual ion beam sputtering deposition 双离子束溅射沉积
- Our purpose is to deposit MgO films by reactive R.F. sputtering deposition, we completed the dynode devices on INVAR substrates. 溅镀制程是现今许多高科技元件的关键技术，因此薄膜的基础科学及相关制程技术的研发为现今学术界及产业界的重大课题。
- By using Ar ion sputtering and X-ray photoelectron spectroscopy, the oxygen contents between the copper plating layer and iron substrate were examined and the existence of oxygen layer was proved. 采用氢离子溅射和X射线光电子能谱相结合的方法，检测焦磷酸盐镀铜层和铁基体界面区含氧量的变化，证明了氧化层的存在。
- Fachun Lai, Limei Lin, Zhigao Huang, Rongquan Gai, Yan Qu，Effect of thickness on the structure, morphology and optical properties of sputter deposited Nb2O5 films, Applied Surface Science 253(4), 1801-1805 (2006). 李雪蓉;赖发春;林丽梅;瞿燕;测量条件对掺锡氧化铟薄膜电学测量结果的影响;物理实验已接受待发表(2007).
- Fachun Lai, Limei Lin, Zhigao Huang, Rongquan Gai, Yan Qu, Effect of thickness on the structure, morphology and optical properties of sputter deposited Nb2O5 films, Applied Surface Science 253(4), 1801-1805 (2006). 李雪蓉;赖发春;林丽梅;瞿燕;测量条件对掺锡氧化铟薄膜电学测量结果的影响;物理实验已接受待发表(2007).
- Reviewed were the effects of various deposition conditions on microstructural,electrical and optical properties of AlN films grown by magnetron sputtering deposition technology. 综述了各种沉积条件对磁控溅射技术生长氮化铝薄膜的微观结构,电学以及光学性能的影响。
