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- Dual ion beam sputtering deposition 双离子束溅射沉积
- Production of Optical Coatings with Ion Beam Sputter Deposition Technique 离子束溅射沉积干涉光学薄膜技术
- ion beam sputtering deposition 离子束溅射沉积
- Optical Constants of Ion Beam Sputtering Deposited Copper Films of Different Thickness 离子束溅射沉积不同厚度铜膜的光学常数研究
- And other PVD methods, such as sputtering deposition, ion beam assisted deposition, and pulsed laser deposition, are also used to prepare BCN thin films. 同时,各种PVD方法也被用来制备硼碳氮薄膜,如溅射法、离子束辅助沉积和脉冲激光沉积等。
- Ion Beam Sputter Depositing Harmonic Beam Splitter by Time-power Monitoring Method 时间监控离子束溅射沉积倍频波长分离膜
- The review ofour work includes: ion implanted contact, ion beam sputtering diposition hardfilm on beryllium and lubricate film on steel and so on. 即离子注入、子束混合、种离子束淀积等技术的研究和应用。
- D. T. Wei, H. R. Kaufman and C. C. Lee, “Ion Beam Sputtering” Chapter of “Thin Films for Optical systems” Ed. By F. R. Flory, Marcel Decker Inc.(1995). ISBN 0-8247-9633-0 . 卫泰宇;李正中;“光学薄膜制镀技术及应用”;国科会光电小组;光电科技资料丛书之二十七;(1998年10月).
- The coating is deposited on thin quartz crystal sheet with double ion beam sputter technique, the measuring results show that the spectral character and image quality are perfect. 采用双离子束溅射技术在石英晶体薄片上淀积了该膜系,经测试,光谱特性满足设计要求,成像效果理想。
- C.C.Lee, Kie-Pin Chuang and Jean-Yee Wu “Thickness distribution of thin films deposited by ion beam sputtering”, Opt. Interference Coating, 8th Topical meeting, July 15-20, Mb8, (2001), Banff, Canada. 邱焕评、叶礼维、吴骏逸、李正中;“离子束能量对于光学薄膜沉积厚度分布之研究”;中华民国真空科技学会2001年会;12月15-16日(2001).
- C.C.Lee, C.J.Tang, J.C.Hsu and J.Y.Wu, ‘‘Rugate filter made with composite thin film by ion beam sputtering,” Opt.Interference Coating, 9th Topical meeting, June 27-July 2, Mc8, (2004), Tucson, USA. 吴骏逸、唐谦仁、李正中;“离子溅镀与电子枪蒸镀方法所得光学薄膜之比较;”中华民国真空科技学会2002年会;11月29-30日;新竹(2002).
- The Summarize of Ion Beam Sputtering Technology 离子束溅射沉积薄膜技术概述
- CUBIC C-N COMPOUND PREPARED BY ION BEAM SPUTTERING 离子束溅射制备立方C-N化合物
- Structure and Properties of Graphite-like Carbon by Ion Beam Assisted Magnetron Sputtering Deposition 离子束辅助磁控溅射制备类石墨碳膜的结构与性能研究
- The crystal growth by glow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced. 介绍了气相中晶体生长的方法,如辉光放电溅射法和离子束溅射沉积法以及晶体外延生长的方法。
- Experimental results show that the ion beam sputtered film is more stable than the electron gun evaporated film. 实验结果显示:离子束溅射膜的性能比电子枪蒸发膜更为稳定;
- Property comparison of optical thin films prepared by E-beam, ion assisted deposition and ion beam sputtering 电子束、离子辅助和离子束溅射三种工艺对光学薄膜性能的影响
- HfO_2 films were prepared by electron beam(EB) evaporation,ion assisted deposition(IAD) and dual ion beam sputtering(DIBS); HfO2薄膜利用电子束蒸发(EB)、离子束辅助(IAD)和双束离子束溅射(DIBS)三种方法沉积。
- Structures and Properties of ZnO Films Grown by Ion Beam Sputtering 离子束反应溅射ZnO薄膜的晶体结构及光学、电学性质研究
- Studies of Teflon Films Grown by Ion Beam Sputtering 离子束溅射作用下聚四氟乙烯薄膜的制备方法