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- Plasma Ion Implantation Technique 等离子体浸没离子注入
- The Fundamental Research on Surface Modification of Pure Titanium and Titanium Alloy Using Plasma Ion Implantation and Multi-arc Ion Plating 等离子浸没注入和多弧离子镀对纯钛及钛合金表面改性的基础研究
- plasma ion implantation 离子浸没注入
- This paper summarises the principle, characters, application and trend of development of Plasma Immersion Ion Implantation. 本文扼要地介绍了等离子体湮没离子注入的基本原理、特点、应用效果及发展趋向。
- Effects of the Ion Implantation on Castanea mallissime BL[J]. 引用该论文 项艳;刘正祥;胡蕙露;张良富.
- The auxiliary electrode radius in a vacant circular pipe is crucial to the ion dose in plasma source ion implantation(PSII),because it affects the resultant surface structure and properties. 在带有共轴零电位附加电极的空心圆管等离子体源离子注入过程中;附加电极半径的大小直接影响到空心圆管端点内表面、端点表面和外表面的离子注入剂量;进而影响空心圆管表面的结构和性质;对空心圆管的不同部位这种影响是不同的.
- Diamond-like carbon (DLC) film was fabricated on NiTi alloys surface adopting novel plasma immersion ion implantation and deposition (PIIID) at room temperature, using C2H2 as plasma source. 采用新型等离子浸没离子注入和沉积(PIIID)法以C2H2为等离子源对NiTi合金进行表面改性。
- AISI304 stainless steel samples were treated with nitrogen ions by high-frequen cy low-voltage plasma immersion ion implantation (HLPIII) technique. 采用高频低电压等离子体浸没离子注入(HLPIII)技术对AISI304不锈钢表面进行了氮离子注入处理;
- The properties of spatial distribution of plasma ion density in RF TCP plasma reaction chamber were diagnosed by a Langmuir probe and the effect of air pressure were investigated. 利用朗缪尔静电单探针诊断了射频TCP离子束辅助电子枪蒸发镀膜装置反应室内等离子体密度的空间分布规律;并分析了气压对等离子体分布的影响.
- The experimental results on fabricating the bipolar ECL silicon IC by ion implantation are reported. 本文简要叙述用离子注入法制造双极硅ECL集成电路的实验结果。
- Thc mutagenic effects of Vc strains by low encrgy ion implantation have been studied. 对低能离子注入Vc生产菌的诱变效应进行研究。
- The distribution of ion implantation dose on the target surface is not uniform, with a peak near the target corner. 注入离子剂量在靶表面的分布不均匀，在边角附近出现峰值；
- A light-sensitive polymer material removed which is used as a mask etching and ion implant steps. 一种暴露于紫外线光即产生聚合作用之抗蚀感光原料，用于化学蚀刻.
- M.Farley, B.Simonton, in “Ion Implantation Science and Technology”, Ion Implantation Technology Co.Yorktown 1996. 宋慧娟等编著，人类与自然科学，五南图书出版公司印行，2003/09。
- First, high-current metal ion implantation with the development of a synthesis of metal silicide of new technologies. 首先用强流金属离子注入发展出合成金属硅化物的新技术。
- The codeposition of Mo-Ni by electroplating and ion implantation were used to add molybdenum into coatings. 又采用钼-镍合金电镀和离子注入钼+铬硅共渗的方法， 得到了含钼的铬硅渗层。
- PIIID: plasma immersion ion implantation doping 等离子体浸没掺杂
- Mutagenic Effect of Ion Implanting on Gluconobacter Oxydans[J]. 引用该论文 吕树娟;王军;姚建铭.
- Plasma source ion implantation tritium 等离子体源离子注入
- Abstract: This paper introduces the application and development of ion plating, ionodialysis, ion implantation and the compound technology. 文摘:介绍了离子镀、离子渗、离子注入及其复合工艺的应用与发展。
