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- CeO_2 films were deposited by pulsed laser ablation on stainless steel substrates at room temperature with the Ar~+ ion beam assistance. 室温下在不锈钢基底上应用Ar~+离子源辅助,准分子脉冲激光沉积了CeO_2薄膜。
- The CeO 2 films were deposited by pulsed laser ablation on hastelloy substrates at room temperature with the Ar + ion beam assistance. 室温下在 Ni Cr合金 ( Hastelloy c-2 75)基底上应用 Ar+ 离子源辅助 ;准分子脉冲激光沉积了Ce O2 薄膜 .
- Sols of copper clusters/n-hexane was prepared through pulsed laser ablation at the interface between copper solid target and a flowing liquid of hexane. 采用脉冲激光轰击浸于流动正己烷中的铜靶,获得铜团簇/正己烷溶胶。
- Different dispersity morphologies of In nanoparticles are prepared by pulse laser ablation at the interface of solid and flowing liquid of cyclohexane/hexnol/water/emulsifier OP. 在环己烷/正己醇/水/乳化剂微乳液中,通过脉冲激光制得并观察到了球形、扁球形、六边形及棒状分散形态的铟纳米粒子。
- In this paper, numerical simulation for temperature field of femtosecond-picosecond pulse laser ablation on metal surface is performed by finite-difference method (FDM). 用有限差分法对飞秒、皮秒脉冲激光在金属表面烧蚀过程的温度场进行了一维数值模拟。
- To quantificationally study the sized distribution of Si nanoparticles in thin films,"uniformity-degree"is used to analyze the experimental results on nanocrystalline Si films prepared by pulsed laser ablation authorized by Lowndes. 为了对纳米Si薄膜中晶粒尺寸的分布进行定量研究,首次提出“晶粒尺寸均匀度”的概念,并对Lowndes等人采用脉冲激光烧蚀方法制备纳米Si薄膜的实验结果进行了定量分析。
- This technique of Pulsed laser ablation (PLA) has been used for microanalysis of material composition, patterning of material surfaces deposition of thin films, etc with successful application. 其中后两部分的工作是基于为相应的类金刚石（DLC）、氮化碳（CNx）和硼碳氮（BCN）薄膜的沉积制备的过程和机理的研究提供参考。
- Pulsed laser ablation deposition 脉冲激光沉积
- pulses Laser ablation 液相激光烧蚀
- Current main use of multi-frequency spectra from the plasma induced by pulsed laser ablating a target was discussed comprehensively. 摘要本文全面讨论了当前激光诱导等离子体多色谱的主要应用。
- Several amorphic carbon films with different thickness were deposited on singlecrystal silicon by means of pulse laser ablating graphet target. 在室温下 ,用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳膜。
- Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature. 在室温下,用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳膜。
- Influence of DC Biasing on Amorphous Carbon Deposited by Pulse Laser Ablation 直流偏压对脉冲激光烧蚀沉积非晶碳膜的影响
- Studies on Atomic and Ion Emission Spectrum Produced by Pulsed laser Ablation of Copper 激光烧蚀铜产生原子和离子光谱线的研究
- Influence of Ambient Gas Pressure on Morphology of nc-Si Film Deposited by Pulsed Laser Ablation in Argon 氩环境气压对激光烧蚀沉积纳米硅薄膜形貌的影响
- Research Development of Nano Materials Produced by Pulsed Laser Ablation on Solid Target 脉冲激光轰击固体靶制备纳米材料
- Influence of the ambient pressure of Ar on the average size of Si nanoparticles deposited by pulsed laser ablation Ar环境气压对脉冲激光烧蚀制备纳米Si晶粒平均尺寸的影响
- Determination of the region where Si nanoparticles form during pulsed laser ablation 脉冲激光烧蚀制备纳米Si晶粒成核区位置的确定
- Numerical simulation for thermal field of intense pulse laser ablation on metal surface 强脉冲激光金属表面烧蚀热场的数值仿真
- PROPERTIES OF EPITAXIAL YBa_2Cu_3O_7 THIN FILMS PREPARED BY PULSED LASER ABLATION 激光淀积YBa_2Cu_3O_7外延超导薄膜
