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- titanium nitride film resistor 氮化钛膜电阻器
- Titanium nitride films were grown by unbalanced magnetron sputtering at different N2 and Ar partial pressure ratios on Ti6Al4V alloy substrate. 采用非平衡磁控溅射技术,在钛合金(Ti6Al4V)表面沉积氮化钛薄膜。 通过改变氮气和氩气分压比(PN/PAr)和基体偏压,制备出不同结构、性能的氮化钛薄膜。
- Titanium nitride films were deposited on silicon(100) substrate at room temperature with various substrate bias voltages (corresponding to various impact energy) by energetic cluster impact (ECI). 在室温下，以硅（100）为衬底，在不同的衬底偏压（即团簇不同碰撞能量）的条件下，用荷能团簇碰撞沉积方法制备了TiN薄膜。
- Microstructures and Properties of Titanium Nitride Film Grown by Unbalanced Magnetron Sputtering 非平衡磁控溅射氮化钛薄膜及其性能研究
- tantalum nitride film resistor 氮化钽膜电阻器
- metal nitride film resistor 金属氮化膜电阻器
- Titanium nitride film 口腔正畸
- Morphology and Physical Properties of Titanium Nitride Films Deposited by Magnetron Sputtering at Room Temperature 室温直流磁控溅射氮化钛薄膜研究
- Study on the Preparation of Hard and Wear-resistant Titanium Nitride Films on Silicon Nitride Ceramic Cutting Tools 氮化硅陶瓷刀具表面涂覆高硬耐磨氮化钛涂层研究
- A Comparison on Structural and Tribological Properties of Diamond-like Carbon and Titanium Nitride Films 类金刚石碳膜和氮化钛的摩擦学性能研究
- Titanium nitride offers the customer wear protection in jet engine bearings. 氮化钛提供了客户的抗磨损保护的喷气发动机轴承。
- Abstract: The key process technology of integrated thin- film resistor, capacitor and passive assembly was introduced. 摘要:介绍了国外集成薄膜电阻器、电容器及无源组件的关键工艺技术的研究情况。
- X-ray diffraction (XRD) measurements reveal formation of titanium nitride in the astreated sample. 利用X射线衍射仪(XRD)对氮化处理后的样品刚试，得到了样品的相结构。
- MORS is a group of small-sized metal oxide film resistor, apply high aluminum content ceramic cores with performance for compact sizes. MORS系列是一小尺寸金属氧化膜电阻;应用铝陶瓷核心之小尺寸电阻.
- The invention relates to a manufacturing method of a titanium nitride layer as well as an apparatus thereof. 本发明涉及一种氮化钛层的制造方法及其装置。
- Based on the preparation of titanium nitride, the effects for the choice of the precursor on the CVD systems have been illustrated. 摘要本文以氮化钛的CVD制备为例，说明了源物质的选择对CVD过程的影响。
- It is also used as the etchant for etching Aluminum and Silicon Nitride film in semi-silicon IC. 在硅平面晶圆集成电路生产中，用于铝及氮化硅的蚀刻；
- All imported (Austria), cobalt high-speed steel. Co-Steel after titanium nitride coating materials, the best use of state properties. 全部采用进口（奥地利）钴高速钢。钴高速钢材料经过氮化钛镀层，达到最佳使用性能状态。
- Skillfully using Wheatstone bridge to refit into nonequilibrium bridge, the electronic digital thermometer is assembled with carbon film resistor or platinum resistor as the sensitive temperature element and digital voltmeter as the display. 巧用惠斯通电桥改装成非平衡电桥 ,使用碳膜电阻或铂电阻作为感温元件 ,数字电压表作为显示器 ,组装成电子数字温度计
- This equipment adopts the titanium nitride metal mixing techs forming ion gold membrane with good abrasion resistance, therefore it fits for various top-grade decorating membrane. 该设备采用氮化钛表面掺金技术,形成离子金膜层,耐磨性非常好,广泛用于各种高档装饰膜层。
