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- vacuum deposition technique 真空淀积技术
- Lida Vacuum Deposition Technology Co., Ltd. 利达真空镀膜技术有限公司。
- The principle of ion assisted deposition technology in the vacuum deposition process is discussed. 讨论了离子束辅助沉积技术在真空沉积过程中的应用原理。
- Vacuum sputter deposition techniques were developed to achieve high Hc , with high Ms materials epitaxially grown on Cr underlayers. 使用真空溅射方法在Cr底层上沉积高矫顽力、高饱和磁化强度的磁记录介质。
- In vacuum deposition,the substrate deformation caused by sustentation and temperature grads can affect the final surface form of film-substrate system. 真空镀膜过程中,基底因支撑、温度梯度造成的应变会对最终的薄膜-基底系统的面形产生影响。
- The reflectors of the space reflective concentrator solar-cell-array were coated with aluminum films by vacuum deposition. 摘要铝膜反射镜是反射式空间聚光太阳电池阵的重要组成部分。
- ZnS Birefringent Sculptured Thin Film Prepared by Glancing Angle Deposition Technique[J]. 引用该论文 王素梅;贺洪波;邵建达;范正修.
- Semiconductor industry: Sputtering system, Vacuum deposition system, Ion plating system, Electron beam process, Vacuum packaging machine, Device handling system. 半导体行业:薄膜制备设备、器件封装设备、各种排气装置等;
- According to the experimental results, a new composite chemical deposition technique of nickel-phos-phorous-Al_2O_3 alloy was proposed for industri... 结果表明,与单一非晶态镀层相比,复合镀层的显微硬度和耐磨性能均更为优异,是一种工艺成本低廉、操作控制简便的表面强化新途径。
- Polysodium 4-styrenesulfonate(PSS)/ alcian blue(AB) molecular deposition(MD) films on quartz substrate were prepared using layer by layer(LBL)deposition technique. 制备了聚苯乙烯磺酸钠/阿利新蓝分子沉积膜。
- The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc. 干镀是一种在真空下在聚合物表面沉积金属的方法,包括溅射、气相沉积、真空沉积等。
- A computer controlled system has been successfully developed to modify the ion beam assisted deposition technique in nano-structured composite thin films growth. 研制成功了一台计算机控制系统,用来改进用于纳米复合薄膜制备的离子束辅助沉积技术。
- The principle, preparation and characterization of the palladium-based composite membranes are reviewed, and a novel photocatalytic deposition technique in our ... 本文综述了钯基复合膜的原理、制备及表征,并重点介绍了本研究组的光催化镀膜工艺。
- CN x films on silicon (111) wafer, quartz and Ti/C substrate with nitrogen concentration up to 20 at% have been prepared by a new plasma deposition technique, filtered arc deposition. 本文采用真空磁过滤弧沉积技术,在Si(111)、石英及Ti/C衬底上制备得到非晶碳氮(CNx)薄膜。
- These results indicate that bismuth, tellurium and selenium could be co-deposited to form Bi2Te3-ySey semiconductor compound by electrochemical deposition technique in the solution containing Bi3+, HTeO2+and Se4+. 结果表明,在含有Bi3+、HTeO2+和Se4+的电沉积溶液中,采用电化学沉积的方法,可实现铋、碲、硒三元共沉积,生成Bi2Te3-ySey半导体化合物;
- Chemical vapor deposition technique(CVD)is available to making highadherent,dense(non-porous)and fine grain platinum metals coatings on the surfaces of refractory metals such as Mo,Re and W et al . 化学气相沉积 (ChemicalVaporDeposition ,CVD)技术可用在高熔点金属如Mo、Re、W等表面制备结合力好的铂族金属涂层。
- Renovating Design of Vacuum Deposition Equipment 真空等离子装置的改进设计
- The principle, preparation and characterization of the palladium-based composite membranes are reviewed, and a novel photocatalytic deposition technique in our research group is highlighted for membrane preparation. 本文综述了钯基复合膜的原理、制备及表征,并重点介绍了本研究组的光催化镀膜工艺。
- double chamber vacuum deposition system 双室真空淀积系统
- The process fundamentals and characteristics are described in this paper,and recent research and ap-plications of spray deposition technique on rapidly solidified materials are reviewed. 简要介绍了喷射沉积技术的基本原理和特点,对其在快速凝固材料中的应用进行了综述。