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- The paper focuses on vacuum vapor deposition for making parylene film which is used in many targets. 介绍了真空气相沉积法制备聚对二甲苯薄膜的实验设备、实验原理和实验方法。
- The paper focuses on vacuum vapor deposition for making parylene film which is used in many targets.The experiment facility and principle are described too. 介绍了真空气相沉积法制备聚对二甲苯薄膜的实验设备、实验原理和实验方法。
- Ultra-High Vacuum Physical Vapor Deposition. 超高真空物理汽相沉积。
- vacuum vapor deposition 真空汽相淀积法
- vacuum vapor deposition method 真空镀积法
- Stacked Ge quantum dots are grown on Si(100) by u ltra-high vacuum chemical vapor deposition(UHV/CVD). 用超高真空化学气相淀积系统在Si(1 0 0 )衬底上生长了多层Ge量子点 .
- Small size, large density and vertical ordering Ge quantum dots (QDs) were grown by ultra-high vacuum chemical vapor deposition(UHV/CVD) system. 采用超高真空化学气相淀积系统制备了小尺寸、高密度、纵向自对准的Ge量子点 .
- UV-Vis Absorption Study of Vacuum Vapor Deposited Lead Phthalocyanine and Vanadyl Phthalocyanine Nanometer Multilayered-film 真空沉积酞菁铅和酞菁氧钒层状纳米复合膜的吸收光谱研究
- Ti coated superhard abrasive (diamond and CBN) micro-powder can be produced industrially by vacuum slow vapor deposition technology. 本文报道了采用真空微蒸发镀覆技术进行工业化超硬材料微粉镀覆生产。
- Research is made on the effect of substrate temperature(?T??s)on defects of SiO?2/Si interface caused by vacuum ultraviolet (VUV)photochemical vapor deposition (CVD). 研究了VUV（真空紫外）光直接光CVD（化学汽相淀积）SiO2/Si界面微结构缺陷与衬底温度（Ts）的关系。
- In vapor deposition,RE elements can increase the bo... 结果表明,稀土元素的加入均能显著提高模具的使用寿命。
- InGaN Films Grown by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 江风益;李述体;王立;彭学新;熊传兵.
- The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc. 干镀是一种在真空下在聚合物表面沉积金属的方法，包括溅射、气相沉积、真空沉积等。
- A chemical vapor deposition process that takes place at moderate temperatures. 一种化学汽相淀积过程,发生在适度的温度下。
- Ultrathin organosilicon films were synthesized by chemical vapor deposition. 用化学气相沉积方法制备了超薄有机硅膜。
- Heavy Carbon Doping of GaAs by Metalorganic Chemical Vapor Deposition[J]. 引用该论文 李宝霞;汪韬;李晓婷;赛小锋;高鸿楷.
- Ultra-high Vacuum Chemical Vapor Deposition (UHVCVD) was a good choice, it provided a super clean, low temperature, low pressure ambient, and controlled thin films' growth precisely. 超高真空化学气相沉积(UHVCVD)具有超净的生长环境、能够在低温、低压下生长锗硅材料,可精确控制薄膜生长等优点。
- The wearresistance of TA1 was improved by chemical vapor deposition(CVD) to enhance the TA1 properties. 为提高TA1表面的耐磨性能,在TA1表面采用化学气相沉积(CVD)表面处理。
- PTFE based dielectric is metallized by vacuum vaporing, vacuum sputtering and chemical plating respectively. 采用真空蒸发、溅射和化学镀铜的方法分别对研制的PTFE基复合介质进行了金属化处理。
- Polycrystalline diamond coatings for tools are laid down using chemical vapor deposition. 工具用的复晶钻石涂层，则是使用化学气相沉积法制造的。
