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- Ion Beam Synthesis and Electrical Properties Study of Yttrium Silicide 钇硅化物的合成及相变研究
- Structural phase transformation in yttrium silicide prepared by ion beam synthesis 离子束合成的钇硅化物结构相变研究
- yttrium silicide 硅化钇
- Structure and infrared absorption characterizations of yttrium silicides formed by ion beam synthesis 离子束合成钇硅化物的结构及红外谱特征
- Lifetime measurement of metastable state of Yttrium atom[J]. 引用该论文 杜清;李世芳;周志尧;朱利洲;林福成.
- Yet according to Cox, yttrium was not even listed in the report. 但根据考克斯的说法,钇甚至没被列入这份报告之中。
- Yttrium serves as an ideal non-magnetic diluent for the rare-earth metals. 钇被用作稀土金属一种理想的非磁性稀释剂。
- A brown-to-yellow mineral is a phosphate of yttrium in crystalline form. 一种褐色到黄色的矿物,是钇的磷酸盐,呈晶体状。
- Abstract: 19 impurity elements in yttrium metal were determined by ICP-AES. 摘 要: 本文介绍了用ICP-AES法测定金属钇中19个杂质元素的方法。
- Yttrium oxide and iron oxide combine to form a crystal garnet used in radar. 元素用途:Combined with europium to make red phosphors for color TV's.
- We can measure the contents of yttrium with EDTA standard solution titration. 用edta标准溶液滴定,可测得氧化钇的含量。
- In this thesis, the formation of NiSi silicide using rapid thermal annealing is investigated. 中文摘要在此篇论文里,使用快速热退火去形成镍化矽的制程被研究。
- The application of titanium silicide in integrated circuits was emphatically introduced. 对硅化钛在集成电路中的应用进行了重点介绍。
- Preliminary results have beenobtained for the early stages of silicide formation on metal surfaces. 综合应用二者对金属硅化物形成的研究已取得初步成果。
- When nickel silicide is formed on silicon substrate, there is a Schottky barrier between silicon and nickel silicide. 当我们在矽基板上形成矽化镍时,将会有萧特基接面存在其间。
- In this thesis, we will provide a novel application of nickel silicide on photo detector. 然而在本篇论文中,我们将会提出一个新颖的矽化镍应用在光侦测器上。
- In this dissertation we focus on the growth and evolution of erbium silicide nanostructures. 在本论文的工作中,我们主要研究硅化铒纳米结构的生长和演化,主要的工作和创新点如下: 1.;在斜切的硅(001)面上获得了取向一致的硅化铒纳米线,长方形纳米岛和正方形纳米岛。
- The effect of oxygen impurity on silicide formation has been observed.Finally, the mechanism on the formation of... 观察到氧杂质对形成条件的影响,简单讨论了离子束混合形成硅化物的机理。
- We have a production line of organic chloride, silicide, nitride compounds and etc. 目前产品以有机卤化物、有机硅化物、氮化物系列产品为主。
- The average microhardness of the laser clad silicide alloy coating ranges from HV650 to HV750. 涂层组织显微硬度在HV650-750之间,沿层深分布均匀;