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- zirconium silicide 硅化锆
- A stable, corrosion-resistant zirconium alloy. 锆合金一种稳定而防腐蚀的锆合金
- A stable, corrosion - resistant zirconium alloy. 锆合金一种稳定而防腐蚀的锆合金
- TANGSHAN HEXIANG ZIRCONIUM INDUSTRY CO., LTD. 唐山贺祥锆业有限公司。
- Zirconium is almost as strong as steel, but lighter. 锆的强度几乎与钢相等,但它比钢轻。
- USAGE: TO PRODUCE OTHER ZIRCONIUM PRODUCTS, PIGMENT , GLASS . ETC. 用途:用于制备其它锆化物、颜料、玻璃等。
- A crosslinker,ammonium zirconium carbonate(AZC)was synthesised. 本文论述了碳酸锆铵交联剂的合成及其与丙烯酸乳胶的组配。
- NOTE: THE ZIRCONIUM CONTENT IS ALL EXCEPT THAT OF ALL IMPURITIES IN 100%. 注:锆含量由100%25减去杂质和量得出。
- Color presentation is pure in transparent or Zirconium opaque glaze. 在透明釉、锆白釉,发色纯正。
- A kind of process for preparing hydrous zirconium fluoride is introduced. 介绍了水合四氟化锆的一种生产工艺。
- In this thesis, the formation of NiSi silicide using rapid thermal annealing is investigated. 中文摘要在此篇论文里,使用快速热退火去形成镍化矽的制程被研究。
- The application of titanium silicide in integrated circuits was emphatically introduced. 对硅化钛在集成电路中的应用进行了重点介绍。
- Preliminary results have beenobtained for the early stages of silicide formation on metal surfaces. 综合应用二者对金属硅化物形成的研究已取得初步成果。
- When nickel silicide is formed on silicon substrate, there is a Schottky barrier between silicon and nickel silicide. 当我们在矽基板上形成矽化镍时,将会有萧特基接面存在其间。
- In this thesis, we will provide a novel application of nickel silicide on photo detector. 然而在本篇论文中,我们将会提出一个新颖的矽化镍应用在光侦测器上。
- The aluminum may be replaced at least in part with finely particled zinc, zirconium, boron, or magnesium. 铝粉至少可以部分地用细粒度的锌、锆、硼或镁所代替。
- In this dissertation we focus on the growth and evolution of erbium silicide nanostructures. 在本论文的工作中,我们主要研究硅化铒纳米结构的生长和演化,主要的工作和创新点如下: 1.;在斜切的硅(001)面上获得了取向一致的硅化铒纳米线,长方形纳米岛和正方形纳米岛。
- The effect of oxygen impurity on silicide formation has been observed.Finally, the mechanism on the formation of... 观察到氧杂质对形成条件的影响,简单讨论了离子束混合形成硅化物的机理。
- We have a production line of organic chloride, silicide, nitride compounds and etc. 目前产品以有机卤化物、有机硅化物、氮化物系列产品为主。
- The average microhardness of the laser clad silicide alloy coating ranges from HV650 to HV750. 涂层组织显微硬度在HV650-750之间,沿层深分布均匀;