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- Inner Stress of Boron Carbon Nitride Thin Films 硼碳氮薄膜的内应力研究
- boron carbon nitride thin film 硼碳氮薄膜
- Preparation of boron carbon nitride thin films by RF magnetron sputtering 射频磁控溅射制备硼碳氮薄膜
- Boron carbon nitride(BCN) thin films were deposited by radio frequency(RF) magnetron sputtering. 采用射频磁控溅射技术制备出硼碳氮(BCN)薄膜。
- In this paper, preparing nanocrystalline carbon nitride thin films has been investigated by using Arc Discharge and dc Hollow Cathode Discharge (HCD). 本文主要论述了采用弧光放电(Arc Discharge)和直流空心阴极放电(DC Hollow Cathode Discharge)两种方法来制备纳米陶瓷氮化碳薄膜。
- Keywords Ultrahard material;Carbon nitride thin film;Radio frequency sputtering; 超硬材料;氮化碳薄膜;射频溅射;电子结构;
- Keywords Carbon nitride thin film,Plasma enhanced pulsed laser deposition （PE-PLD）,Plasma enhanced chemical vapor deposition （PE-CVD）,Deposition parameter,Growth mechanism; 氨化碳薄膜;等离子体增强脉冲激光溅射沉积（PE-PLD）;等离子体增强化学气相沉积（PE-CVD）;沉积参量;生长机理;
- Boron carbon nitride (BCN) attracts widespread interest as a promising technical material for many potential applications because of its unique physical and chemical properties. 硼碳氮(BCN)是一种新型的人工合成功能材料，它具有一系列优异的物理化学特性，有着极其广泛的应用前景。
- Investiagtion of Nanoscale Carbon Nitride Thin Films Grown Using DC HCD Hollow Cathode Discharge 生长的纳米级碳的氮化物薄膜研究
- CARBON NITRIDE THIN FILMS PREPARED BY PULSED XeCl EXCIMER LASER DEPOSITION ASSISTED BY DC GLOW DISCHARGE 辉光放电等离子体辅助XeCl准分子激光溅射沉积碳氮薄膜
- Optical properties of carbon nitride thin films prepared by radio frequency sputtering 氮化碳薄膜的电子结构和光学性质
- In order to obtain cubic boron nitride thin films the working gas pressure must be appropriate, otherwise the cubic phase can not be synthesized. 在其他条件不变的情况下,研究了工作气压对制备立方氮化硼薄膜的影响。
- Boron carbon nitride (BCN) films were deposited onto silicon substrates by medium frequency magnetron sputtering from graphite and boron targets with feedstock of nitrogen and argon. 采用中频磁控溅射技术,使用N2和Ar混合气体作为反应气体,分别溅射硼靶和石墨靶,在单晶硅衬底上制备了BCN薄膜。
- On the other hand, it is essential to prepare high quality silicon nitride thin film for gate insulator layer of TFT in order to get excellent TFT. 与此同时,制备高质量的栅绝缘层用氮化硅薄膜也是制备高性能薄膜晶体管(TFT)这一课题的需要。
- XPS study of cubic boron nitride thin films 立方氮化硼薄膜表面的XPS研究
- There are three types of photoexcitation-photoemission processes for electron-holes in the photoluminescence from silicon-rich silicon nitride thin films. 摘要对于富纳米硅氮化硅薄膜的光致发光，其电子-空穴对存在3类光激发-光发射过程。
- Progress and Preparation Methods of Silicon Nitride Thin Film 氮化硅薄膜制备方法现状综述
- Keywords carbon nitride superhard thin film high speed steel tooKHSS） coated cutting tool; 氨化碳;超硬薄膜;高速工具钢;涂层刀具;
- Influence of Substrate Bias on Field Emission Characteristics of Boron Nitride Thin Films 基底偏压对氮化硼薄膜场发射特性的影响
- Influence of Working Gas Pressure on the Preparation of Cubic Boron Nitride Thin Films 工作气压对制备立方氮化硼薄膜的影响
