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- The effect of second anode action on the cathode vacuum arc discharge stability in the cathode arc deposition technology is studied. 研究了阴极弧等离子体沉积中第二阳极现象改善弧放电稳定性的作用。
- cathodic arc discharge 阴极电弧放电
- Fluorescent is a low pressure mercury-smoke arc discharge lamp. 日光灯是一种低气压的汞蒸气弧光放电灯。
- We used DC arc discharge to synthesize carbon nanotubes. 在本论文中我们研究利用网印的技术来制做场发射显示器。
- Amorphous diamond films deposited on n-type Si (100) and samarium-on-silicon (Sm-on-Si) substrates are fabricated by a cathodic arc process. 因非晶钻石具有负的电子亲和力，故可用来研究其场发射的特性。
- Cathodic arc ion plating (CAIP) has been widely applied in modern technology field. 多弧离子镀在现代科技领域中有着广泛的应用。
- DLC films are deposited onto pure titanium diaphragms of excellant quality and appearance by cathodic arc deposition technique. 在制备品质及外观兼优的纯钛振膜的基础上，利用阴极电弧沈积技术在钛膜沈积类金刚石(DLC)膜层。
- R.L.Boxman and S.Goldsmith, Macroparticle contamination in cathodic arc coatings: generation, transport and control, Surface and Coatings Technology, 52 (1992)39. 张振福，微波化学气相沉积及磁控溅镀成长类钻石之研究，国立中山大学电机工程学系博士论文，91年6月。
- The high quality DLC films were successfully deposited on the surface of silicon substrates at room temperature by the filtered cathodic arc plasma(FCAP) equipment. 利用自行研制的磁过滤等离子体技术(FCAP),并创造性地对衬底施加低频率周期性负偏压,在室温下的单晶硅表面上制备了高质量的非晶金刚石薄膜。
- Arc Discharge Influence on Output Characteristic of Gas Laser Resonator for Multi-pair Electrodes. 弧光放电对多电极对气体激光器输出特性的影响
- Abstract This article describes three patent samples which represent the state of the art of cathodic arc plasma depisition in recent years, and gives some summaries. 本文介绍了三件阴极电弧沉积的专利。这些专利代表了近年来阴极电弧沉积技术的发展状况，并给予简要的一些评论。
- SWCNTs are produced by three main techniques: arc discharge, laser ablation and chemical vapor deposition (CVD). SWCNTs的制备方法很多，包括电弧放电法、激光蒸发法、化学气相沉积法(Chemical Vapor Deposition，CVD)等。
- Multi-arc ion plating technique is using cool cathode with self-maintaining arc discharge as evaporation source. 多弧离子镀技术是一种在真空中将冷阴极自持弧光放电用于蒸发源的镀膜技术。
- N-doped carbon coated Fe,Co,Ni nanocrystals were prepared by an AC arc discharge method under nitrogen buffer gas. 采用交流电弧法;在氮气氛下合成了氮杂碳包金属Fe、Co、Ni纳米晶.
- Low energy ions were produced in gas arc discharge,and the ions were accelerated into tyrosine(Tyr) aqueous solution. 分别以注入机和气体常压弧光放电产生的低能离子作用于固态和溶液中的氨基酸， 研究了样品红外光谱的变化。
- A method,degrading highly concentrated organic wastewater by gas-liquid phase gliding arc discharge,is introduced. 介绍了一种气液两相滑动弧放电等离子体处理高浓度有机废水的新方法。
- RCAE1047 will be stable in arc discharge at higher vacuum condition and lower arc current, especially for pure Zr target. 1047可以在高真空和低电流条件下稳定弧光放电工作,特别是采用纯锆靶材时。
- The coating nano-metal materials are prepared by physical adsorption, surface deposition, arc discharge, plasma polymerization, laser CVD and emulsion polymerization. 其制备方法主要有物理吸附法、表面沉积法、电弧放电法、等离子体聚合法、激光化学气相沉积法、乳液聚合法等。
- In the paper , the working principle and manufacture process of the bigger power arc discharge sources Were discribed briefly. 本文主要论述了大功率弧光放电电源的工作原理及其制造过程。
- In this paper, preparing nanocrystalline carbon nitride thin films has been investigated by using Arc Discharge and dc Hollow Cathode Discharge (HCD). 本文主要论述了采用弧光放电(Arc Discharge)和直流空心阴极放电(DC Hollow Cathode Discharge)两种方法来制备纳米陶瓷氮化碳薄膜。
