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- electroformed photomask 电镀形成的光掩模
- Electroform of skin adopts different kind of current. 皮肤电采用与众不同的特殊电流，使皮肤电阻数据采集灵敏度高，增益调整范围大，适于不同皮肤特性的检测。
- A novel method and system for photomask manufacturing rule check (MRC) were introduced. 摘要介绍了一种较为先进的光罩可制造性规则检查的方法及其系统构成。
- The features in an electroformed stencil are formed in one process so aperture count does not affect costs so dramatically. 电铸钢网的特性是一次形成的，因孔数对成本的影响不是那么大。
- The present invention discloses a producing method for a photomask and a thin-film transistor basal plate. 本发明公开了一种光掩模及薄膜晶体管基板的制造方法。
- The extreme precision of the process targets electroformed stencils for use in ultra-fine pitch applications. 但是，当特定的应用需要光滑的孔面，激光切割孔在切割之后可能进行电抛光或电镀。
- Electroformed apertures reproduce the mandrel photo resist finish faithfully and do not require any further processing. 电铸复制卷筒照片孔型图，不需要进一步的加工。
- In this paper,the electroformed shaped charge liners made by different techniques are analyzed by EBSD. 利用电子背散射衍射对不同电铸成形工艺的药型罩进行了分析研究,研究表明:电铸药型罩的晶粒为超细晶粒;
- Before using of electroformed iron metal and iron Alloy, we have to take the heat treatment. 电铸层使用前必须进行回火处理。
- Xie Changqing,The Fabrication Technique for Next generation photomask, Microelectronic Technology[J]. 2000,28(6): 1-4. (in Chinese). [1]谢常青.;下一代光学掩模制造技术[J]
- The effect of pulse current parameters on the internal stress of electroformed layer is discussed based on the test. 通过试验,讨论了脉冲电流电参数对镍铸层内应力的影响;
- The results showed that wear ratio of copper tool-electrodes electroformed with pulse current were obvious lowe... 结果表明,脉冲电铸铜电极可降低损耗,且在一定工艺条件下脉冲电铸电极具有优异的耐电蚀性能。
- The electroformed Ni-Mn alloys hold good prospects for its specific performance. 电铸镍锰合金因其特殊的性能而具有重要的应用前景。
- The initial experiments on and analysis of sheet resistance, contact, photomask alignment, line width, and correlations between device parameters and dopants have been made. 对薄层电阻、接触、光掩模对准、线条宽度、器件参数与掺杂的相关性等内容进行了初步试验和分析。
- Focus on the stability of sub-industries performance, the IC design industry has minimum volatility, secondary is lead-frame, photomask and IC packaging and testing industries. 四、子产业绩效表现之稳定性，以IC设计业的波动最小，其次为导线架业、光罩业及IC封装测试业；
- The photomask auto-correction method can enhance the ability of automation in area-forming rapid prototyping system and reduce efficiently negative influence of human error. 光罩自动校正法可增加面成型快速原型系统的自动化能力，并有效降低人为误差造成的负面效果。
- The principles of LIGA process on mask, X-ray lithography, electroform and model were analyzed. 对LIGA工艺掩膜、X射线光刻、电铸及塑铸等进行了工艺原理分析。
- So, it could be suggested that the thermal treatment is an effective way to minimize residual ions, and reduce haze issues when the photomask using in 193nm stepper or scanner. 通过在传统光掩模清洗后引入加热处理和热去离子水的冲洗，可以有效减少光掩模表面离子残留，从而防止和减少光掩模在193nm波长光刻应用中生成雾状缺陷(haze)。
- A special device was designed to electroform the thin-wall revolving parts such as a nozzle with Ni-Mn alloy. 设计了特殊的电铸装置,开展了喷管形薄壁回转体零件的镍锰合金电铸试验。
- Compared with the well known manufacturing method of a pixel structure, the invention can simplify processing steps and reduces the manufacturing cost of photomask. 本发明相比于公知的像素结构制作方法，可以简化工艺步骤并减少光掩模的制作成本。
