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- electrolytic etching technique 电解浸蚀技术
- Graining Technology by Electrolytic Etching on the Surface of Aluminum Alloys. 电镀防护性锌基合金镀层钝化膜的耐蚀性。
- Dow etching: A powerless etching technique for letter-press plates invented by Dow Chemical Corporation. 陶氏腐法:陶氏化学公司发明的一种无粉腐技巧。用来制造活版印版。
- Dow etching A powerless etching technique for letter-press plates invented by Dow Chemical Corporation. 陶氏腐法陶氏化学公司发明的一种无粉腐技巧。用来制造活版印版。
- It is necessary to measure Young's modulus of micro-mained materials because of the special manufacture process by using silicon etching technique. 摘要利用蚀刻矽技术制造的微机械构件，由于特殊的制作工艺而需要对其材料的杨氏模量进行测量。
- Lising KOH anisotropic wet etching technique to obtain the V-shape structure of fiber array.This technique apply precrision alignment to control undercut effective. 利用KOH非等向性湿蚀刻技术，得到光纤阵所需之V型凹槽结构，并配合精确对准光罩之应用，有效控制侧蚀量，应用于光纤阵列晶圆制程技术。
- It is necessary to measure the mechanical properties such as Yong's modulus of micro\|machined materials because of the special manufacturing process by using silicon etching technique. 利用蚀刻硅技术制造的微机械构件,由于特殊的制作工艺而需要对其材料的机械性能如杨氏模量等进行测试。
- Aluminum alloy can be colorfully decorated by electrolytic etched pattern graining following anodic oxidization and electrolytic coloring. 通过电解刻蚀在铝合金表面形成图纹，然后再阳极氧化、电解着色，可使铝合金具有多彩的装饰性。
- Three potentials pertinent to various etching techniques are labeled in Fig. 10. 与各种蚀刻技术有关的三个电势标出在图10中。
- Produces relief plates for letterpress printing by photo-mechanical and washout or etching techniques. 运用照相复制及腐蚀技术制备凸版以供印刷。
- Etching Technique of Inductive Couple Plasmas 感应耦合等离子刻蚀技术研究
- A type of transistor in which very thin barriers ( by means of etching techniques ) are used, thus permitting the frequency range to be extended to 100 MHz. 使用很薄势垒的一类晶体管(采用刻蚀技术),因而,其使用频率范围可达100兆赫。
- Study on Microchannel Plate Etching Technique 微通道板腐蚀工艺研究
- Keywords Welded joint;Metallographical structure;Electrolytic etching;Chemical etching; 焊接接头;金相组织;电解侵蚀;化学侵蚀;
- Keywords aluminum alloys;electrolytic etching;pattern graining;electrolytic mechanism; 铝合金;电解刻蚀;图纹化;电解机制;
- In this thesis, etched walls with verticality of better than 89? and Root-mean-Square (RMS) surface roughness of below 10 nm are achieved by using non-switched Inductivity Coupled Plasma (ICP) etching technique. 论文采用无切换的电感耦合等离子体刻蚀(ICP)技术在SOI材料上刻蚀出垂直度好于89°、均方根表面粗糙度小于10nm的刻蚀侧壁。
- Study on Correlative Factors Affecting Alkaline Electrolytic Etching in Cobalt-chromium Alloy and the Ultrastructure in Cohesive Face of Etching 相关因素对钴铬合金碱性电解蚀刻的影响及蚀刻粘结面超微结构观察
- That is a beautiful etching of a bird. 那是一只鸟的漂亮的蚀刻画。
- The technique is still at the experimental stage. 这项技术正处于实验阶段。
- Etching Techniques by an ECR Plasma Source 电子回旋共振等离子体的刻蚀技术
