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- ion beam deposition equipment 离子束沉积设备
- Diamond like carbon (DLC) films on single crystal silicon and other substrats were produced by low energy ion beam deposition. 研究了利用低能离子束技术，在单晶硅片等多种基体表面形成类金刚石薄膜（DLC膜）。
- The conceive of assembling ETM arrays in a porous anocic alumin membranes by electron beam deposition combined with ion beam bombardment technique were proposed in this project. 本项目提出了利用电子束蒸发加离子束轰击的方法将ETM组装到纳米孔氧化铝膜中的设想。
- Ion beam deposition film technology and application 离子束沉积薄膜技术及应用
- Keywords Dual ion beam deposition;Depth profile;Silica;Heterojunction; 双离子束淀积;深度剖析;氧化硅;异质结;
- Keywords Ion beam deposition;Nano films;Roughness;X-ray photoelectron spectrum（XPS）; 离子束沉积;纳米薄膜;粗糙度;X射线光电子能谱;
- Antireflective film prepared by periodic ion beam assisted deposition[J]. 引用该论文 张大伟;黄元申;贺洪波;邵建达;范正修.
- ion beam deposition 离子束淀积
- It is a technique called ion beam writing. 这一技术被称为离子束刻写。
- Ion beam mutation has significant bio-effect. 摘要离子诱变具有显著的生物学效应。
- Using sintered B4C as target material, ternary BCN thin films were synthesized by means of pulsed laser deposition assisted by nitrogen ion beam. 以烧结B4C为靶材料、在氮离子束辅助下用脉冲激光沉积方法制备了三元化合物硼碳氮(BCN)薄膜。
- Ensinger W.Ion Source for ion beam assisted thin film deposition[J].Rev.Sci.-Instrum.1992,63(11):5217. 潘永强;朱昌;陈智利;等.;端部霍尔离子源工作特性及等离子体特性研究[J]
- A copper film is coated on carbon nanotubes(CNTs) films by ion beam assisted deposition(IBAD). 本文用离子束辅助沉积(IBAD)方法在碳纳米管薄膜表面制备铜薄膜。
- A dual-channel optical filter was designed using photonic crystal concept and prepared by Ion Beam Assisted Deposition(IBAD). 利用一维光子晶体进行了双通道窄带滤光片的设计,并利用离子束辅助沉积方法进行了滤光片的镀制。
- And other PVD methods, such as sputtering deposition, ion beam assisted deposition, and pulsed laser deposition, are also used to prepare BCN thin films. 同时，各种PVD方法也被用来制备硼碳氮薄膜，如溅射法、离子束辅助沉积和脉冲激光沉积等。
- The superhard Ti-B films were performed on p-type Si(100) substrates by ion beam enhanced deposition, with varying deposition rate and Xe ion beam energies. 采用离子束增强沉积方法，在p型（100）单晶硅衬底上，通过不同能量的氙离子辅助轰击，以不同的沉积速率制备了Ti－B超硬薄膜。
- Abstract： C-N films were synthesized on high-resistance Si(111) substrates by cluster beam deposition method. 利用荷能团簇沉积装置在高阻硅(111)衬底上沉积了碳氮薄膜。
- Focused Ion Beam is an advanced micro/nano technology for figure observation, orientation making-sample, component analysis, film deposition and maskless etching. 聚焦离子束技术是一种集形貌观测、定位制样、成份分析、薄膜淀积和无掩模刻蚀各过程于一身的新型微纳加工技术。
- A computer controlled system has been successfully developed to modify the ion beam assisted deposition technique in nano-structured composite thin films growth. 研制成功了一台计算机控制系统，用来改进用于纳米复合薄膜制备的离子束辅助沉积技术。
- The formation and status of clusters are basic and important problems instudy of the mechanism of ionized cluster beam deposition (ICBD) technique. 原子团的形成和状态是研究离化原子团淀积（ICBD）机理的首要问题。
