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- magnetron sputter ion plating(MSlP) 磁控溅射离子镀
- unbalanced magnetron sputter ion plating technique 非平衡磁控溅射离子镀技术
- The results of EPMA showed that the metallicfllms deposited on the metallic substates by the magnetron sputtering ion plating process are the mixed filmswhich consist of the elements of the target and the substrate. 电子探针分析表明,金属基体磁控溅射离子镀金属膜是靶材元素和基材元素组成的混合膜。
- Application and Study of the Closed Field Unbalanced Magnetron Sputter Ion Plating on Router for PCB 闭合场非平衡磁控溅射离子镀技术在PCB铣刀上的应用与研究
- Application of Multiple Metal Coating of Closed Field Unbalanced Magnetron Sputter Ion Plating in PCB Micro-drill 闭合场非平衡磁控溅射离子镀复合金属镀层在PCB微钻中的应用
- Effect of bias voltage on morphology and performance of magnetron sputter ion plating graphite-like carbon coatings 磁控溅射离子镀基体偏压对类石墨碳膜组织形貌及性能的影响
- Keywords depleted uranium;niobium coating;magnetron sputter ion plating;electrochemical corrosion; 贫铀;铌镀层;磁控溅射离子镀;电化学腐蚀;
- magnetron sputtering ion plating 磁控溅射离子镀
- magnetron sputter ion plating 磁控溅射离子镀
- ABSTRACT: In this paper a reactive ion plating method and system configuration of Gas Ion source enhanced Magnetron Sputtering (GIMS) is presented in details. 摘要：本文详细介绍了气体离子源增强磁控溅射（气离溅射）反应离子镀膜技术和系统配置。
- Effect of Pulse Bias Voltage on Adhesive Strength of Magnetron Sputtering Ion Plated Al Coating on Depleted Uranium Surface 脉冲偏压对贫铀表面磁控溅射离子镀铝结合强度的影响
- The ion gold mixing plating is multi arc ion plating combining with magnetron sputtering technique and is mainly used in gold plating to replace the commonly used but harmful nickel plating. 离子掺金镀是多弧离子镀与磁控溅射有机复合技术，主要用于离子镀金代替目前盛行而危害人体健康的闪镍工艺。
- Superimposed Pulse Bias Voltage in Arc Ion Plating and Magnetron Sputtering 脉冲工艺在薄膜制备中的应用
- Si rich SiO2 films have been prepared by a rf magnetron sputter method. 用射频磁控溅射法制备了富硅二氧化硅薄膜。
- The model of the magnetic mirror effect in the unbalanced magnetron sputtering ion beams 非平衡磁控溅射系统离子束流磁镜效应模型
- Its principle and some other related aspects are briefly described,including the magnetron sputter coater and the osmium plasma coater. 本文将主要叙述等离子溅射镀膜的原理与方法,并且简单介绍磁控管溅射仪和锇等离子镀膜仪等。
- YE Zhi-zhen.The technology of magnetron sputter deposition and it's application in material science[J].Mater Scien Engineering 1989,7(1):26-32. [6]叶志镇.;磁控溅射技术及其在材料科学中的应用[J]
- NiCrAlY coating was deposited on Ti6Al4V substrate by arc ion plating (AIP). 采用电弧离子镀(AIP)技术在Ti6Al4V基体表面沉积制备了NiCrAlY涂层。
- NiCrAlY coatings were deposited on superalloy IC-6 by arc ion plating (AIP). 采用电弧离子镀技术在IC-6高温合金上沉积NiCrAlY涂层.
- Morever, the properities of GiC and DiC coatings prepared with unblanced magnetron sputter installation by Teer Coating Ltd were compared with the present TiN-based coatings. 同时与英国Teer公司闭合场磁控溅射制备的含Cr类金刚石碳膜（DiC）、类石墨碳膜（GiC）进行了比较。
