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Endoscope assisted microneurosurgery improves the total remove rate. 结论经蝶显微手术仍是一种较为实用手术，显微外科辅助内窥镜可提高大型垂体腺瘤的全切率。
Let' s take the metal removal rate for example. 让我们以金属切削速率为例。
The removal rate of NH3-N was up to 73.3%. 在脱氮模式中氨氮的去除率达到了73.;3%25；
The removal rate of sulfide is high. 硫化物的去除率很高。
The result indicated that the material removal rate of isopulse generator is over 20% higher than that of general pulse generator. 实验结果表明，与普通脉冲电源相比,等能量脉冲电源可以提高加工效率20%25以上。
This paper proposed a viewpoint to explain why vibration assistance may increase material removal rate (MRR) in vibration-assisted finishing process. 摘要讨论振动研磨加工过程中通过辅助振动提高材料去除率的原因。
Experiment results showed that WEDM in atmosphere offers advantages such as better straightness,shorter gap length and higher material removal rate. 实验结果表明,气中加工的直线度好、放电间隙窄、加工速度(材料去除率)高。
Experiment results showed that WEDM in atmosphere offers advantages such as better straightness and higher material removal rate. 实验结果表明,气中线切割加工具有加工表面直线度好、加工速度(材料去除率)高等优点。
Both high material removal rate(MRR) and smooth surface have to be achieved in primary chemical mechanical polishing(CMP) of hard disk substrates. 硬盘盘基片粗抛光必须在较高材料去除率的基础上获得高表面质量。
Larger diamond crystals and greater diamond protrusion will result in a potentially faster material removal rate when there is enough horsepower available. 金刚石晶体和金刚石突较大将导致更大更快的物质可能有足够的去除率马力刊物。
The material general removal rate and the dynamic mechanism of tooth surfaces modified and corrected mutually during lapping process of hypoid gears were firstly investigated. 摘要研究了螺旋锥齿轮齿而综合研磨率、动态互研与研齿修形机理。
With the optimized normal rake angle, machining force and temperature change less, but material removal rate is improved obviously with increasing cutting speed. 通过优化刀具前角，提高切削速度，切削力和切削温度变化较小，但是显著提高了材料去除率。
The concentration of EN in the water was relative stable and the remove rate of Egeria najas to EN varied consistently especially when at 0.10,0.50,1.00 and 1.50mg/L, namely increased at first and then declined. 50 mg/L、1 .;00 mg/L和一somg/L这JL组，即先上升后下降。对照组和Hg，+浓度为0
Analysis of Inorganic Materials Micro Structure 无机材料显微结构分析
The polishing pad is main consumables of the CMP system, the structure and surface roughness of pad have great effects on the material removal rate and surface roughness of wafer. 抛光垫是化学机械抛光(CMP)系统中的主要耗材之一，抛光垫的结构和表面粗糙度对CMP过程中的硅片材料去除率和表面粗糙度有很大影响。
Ultrasonic is applied in slider lapping. Experiment show that material removal rate and the roughness of surface are improved. The pole tip recession (PTR) is reduced. 在硬盘磁头抛光中加入超声波,可以提高材料去除率、降低表面粗糙度值、减小极尖沉降。
The TP and COD removal rate of HRT 3, HRT 6 and HRT 9 were above 80%. 水力停留时间为3天、6天和9天的反应器,厌氧消化液的磷和COD去除率都在80%25以上。
The material is flawed throughout. 这种材料到处是裂缝。
The biomass decreased and the COD removal rate slightly increased aftervards. 此后生物量逐渐下降，COD去除率略有上升。
It is concluded that when the silicon and pad rotate with the same rotational velocity, the material removal rate (MMR) is proportional to the rotational velocity. 当晶片和垫板的转动角速度相同时，得出材料去除率(MMR)与垫板和晶片相对速度成正比的结论。