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- On the other hand, utilizing Rapid Thermal Processing (RTP) system, SiNWs were prepared on the same substrates as above. 另外，通过1150℃和1200℃下30s的快速热处理(Rapid Thermal Processing，RTP)，在镀金硅衬底上生长出SiNWs。
- The effect of nickel contamination under rapid thermal processing (RTP) on the magic denuded zone (MDZ) in Czochralski silicon is investigated. 摘要研究了过渡族金属镍在快速热处理作用下对直拉单晶硅中洁净区形成的影响。
- The effect of high temperature in rapid thermal process (RTP) on the dissolution of oxygen precipitate generated by two-step (low-high) annealing is investigated. 摘要通过对已经过两步（低－高）退火的大直径直拉矽单晶片进行高温快速热处理，研究矽中氧沈淀被高温快速热处理消融的情况。
- The effects of the transition metals copper and nickel on oxygen precipitation in Czochralski silicon under a rapid thermal process are investigated. 摘要研究了快速热处理工艺下直拉单晶硅中过渡族金属铜、镍对内吸杂工艺中氧沉淀形成规律的影响。
- Hill, C., Jones, S., and Boys, D., 1989, Rapid Thermal Annealing-Theory and Practice, in Reduced Thermal Processing for ULSI, NATO ASI Series B: Physics, pp. 143-180. 王振源及吴志阳;2001;“快速热处理机台即时温度量测系统最佳化设计;”机械关键系统技术研究发展第二期三年计划;中山科学研究院.
- Timans, P. J., Morishige, R. N., and Wasserman, Y., Emissivity-independent Rapid Thermal Processing Using Radiation Shield, Mat. Res. Soc. Symp. Proc. 470,57-62,1997. 黄新员“热辐射在高速热处理中对晶圆温度之影响”元智大学机研所硕士论文,1997。
- 1 Advanced AG610 Rapid Thermal Processing System. 高级的AG610快速退火炉系统.
- rapid thermal processing (RTP) 快速热处理
- rapid thermal processing(RTP) 快速热处理（RTP）
- rapid thermal process (RTP) 快速热退火
- rapid thermal process(RTP) 快速热处理
- Monocrystalline silicon solar cells fabricated by rapid thermal processing 快速热处理法制备单晶硅太阳能电池
- This is the RTX (Rapid Thermal Exchange) glove. 这是一个RTX (快速热量调换)手套。
- Impact of Transition-Metal Contamination on Oxygen Precipitation in Czochralski Silicon Under Rapid Thermal Processing 快速热处理工艺下直拉单晶硅中铜、镍对氧沉淀的影响
- Effect of Rapid Thermal Processing at High Temperature on Generation and Annihilation of Thermal Donors 高温快速热处理对硅中热施主的影响
- Keywords Czochralski silicon;Oxygen precipitation;Internal gettering;Rapid thermal processing;Neutron-irradiation; 直拉硅;氧沉淀;内吸杂;快速热处理;中子辐照;
- Effect of Rapid Thermal Processing on Oxygen Precipitation in Czochralski Silicon Subjected to Simulating CMOS Thermal Processing 快速热处理对直拉硅单晶在模拟CMOS热处理工艺时氧沉淀的影响
- Influence of rapid thermal process on the structure and properties of Ni-Cr thin-films fabricated by ion beam sputtering 热处理对离子束溅射Ni-Cr薄膜性能和结构的影响
- rapid thermal processing 快速热处理
- Blue|emitting porous silicon(PS) prepared by hydrothermal etching was treated by rapid thermal oxidation (RTO) process. 对用水热腐蚀技术制备的、具有蓝光发射的多孔硅样品在快速热氧化 (RTO)处理前后其光致发光谱、硅纳米颗粒的大小及尺寸分布变化进行了研究 .
