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- 反应离子束刻蚀(RIE)RIE
- 反应离子束刻蚀reactive ion beam etching (RIBE)
- 反应离子束刻蚀及其应用Reactive Ion Beam Etching and Its Application
- 反应离子束刻蚀闪耀光栅技术TECHNOLOGY OF REACTIVE ION BEAM ETCHING OF BLAZED GRATINGS
- 反应离子刻蚀RIEreaction ion etching(RIE)
- 离子束刻蚀ion beam etching
- 反应离子束蚀刻reactive ion beam etching (RIBE)
- 在等离子刻蚀模式下,表面形成了比使用RIE情况下更厚的钝化层。In the plasma-etching mode the passivation layer that is formed on the surface is likely to be thicker than in the case of RIE.
- 全自动反应离子腐蚀3英寸GaAs片实验研究Experimental Investigation of Fully Automatic Reactive Ion Etching 3 inch GaAs Wafer
- 重离子束内爆heavy ion beam implosion
- 射束刻蚀法beam lithography
- 深反应离子deep reactive ion
- 使用聚焦离子束在同一位置蚀刻及纳米晶体成形技术发展ETCHING AND NANOCRYSTAL FORMING TECHNOLOGY DEVELOPMENT AT SAME POSITING USING FOCUSED ION BEAM
- 反应离子蚀刻技术reactive ion etching technique
- 用于模拟X射线热-力学效应的高功率脉冲离子束研究进展Progress in studying high power pulsed ion-beams for simulating thermal-mechanical effects on the material to be irradiated by X-ray
- 碳离子束carbon ion beam
- 离子束源ion beam source
- SF_6/CCl_2F_2反应离子深刻蚀硅中加O_2的研究STUDY ON DEEP REACTIVE ION ETCHING OF SILICON USING SF_6/CCl_2F_2 WITH O_2 ADDITION
- 微离子束ion microbeam
- 氩离子刻蚀对高温超导YBCO薄膜物理特性的影响EFFECTS OF PHYSICAL CHARACTERISTICS ON YBCO HTS THIN FILM BY ARGON ION BEAM ETCHING