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- 纳米晶Ninanocrystalline Ni
- 研究结果表明,在优化的工艺条件下,可获得应力为230 MPa、硬度高达988 HV、无裂纹的纳米晶Ni-W薄膜材料,为其在MEMS微器件、微模具制备上的应用提供了有效途径.The results show that in the optimum process,the nanocrystalline Ni-W film without crack can be obtained,and its stress is 230 MPa,hardness is 988 HV.In this way,Ni-W film may be widely applied in the manufacture of MEMS device and micro-molding.
- 硼离子注入对多晶Ni力学性能及微观结构的影响EFFECTS OF B~+ IMPLANTATION ON MECHANICAL PROPERTIES AND MICROSTRUCTURE OF POLYCRYSTALLINE Ni
- 低能离子束轰击对非晶Ni-P薄膜组织与性能的影响Influence of Low-Energy Ion Beams Bombardment on Mi crostructure and Properties of Amorphous Ni-P Film
- 纳米晶Co-Ni合金nanocrystalline Co-Ni
- ZnO纳米晶ZnO nanocrystal
- 纳米晶镍nanocrystalline nickel
- CdS纳米晶CdS nanocrystal
- 纳米晶化nanocrystallization
- 纳米晶铜nanocrystalline copper
- Ge纳米晶Ge nanocrystals
- 金纳米晶gold nanocrystals
- 纳米晶种nanosized seeds
- 铟纳米晶indium nanocrystal
- InP纳米晶indium phosphide nanocrystallite
- MgO纳米晶magnesium oxide nanocrystallite
- BST纳米晶BST nanocrystals
- 微纳米晶micro-nanocrystal
- 纳米晶Sinano-crystalline Si
- 纳米晶铁nano-grain iron
