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- The vapour generator for chemical vapour deposition plants allows the extraction of vapours. 用于化学汽相沉积器的蒸汽发生器允许蒸汽抽提。
- Metal organic chemical vapour depositi. 金属有机物化学气相沉积。
- Applications of vapour generation atomic spectrometry for the determination of cadmium. 镉的气体发生原子光谱法测定。
- The continuous SiC fibers coated with B 4C using chemical vapour deposition(CVD) were made. 采用化学气相沉积 (CVD)方法 ,在连续SiC纤维表面沉积一层B4C涂层。
- Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper. 本文评述了化学气相沉积法制备人造金刚石薄膜的进展情况。
- This paper reviews comprehensively the recent development of amor- phous silicon films fabricated by light induced chemical vapour deposition(LCVD). 本文较系统地评述了光诱导化学汽相淀积(LCVD)技术淀积非晶硅薄膜的开发现;
- The device contains chemical vapour sensors that react to the presence of volatile organic compounds, or VOCs, in a person’s exhaled breath. 这个装置含有化学气化感受器，能与人们所呼出气体中挥发性有机成分相互反应。
- Thin film of tellurium was prepared by chemical vapour deposition on the polyethylene foils using room-temperature decomposition of electrochemically generated hydrogen telluride. 用化学气相沉积法制备碲薄膜,其步骤为:通过电化学方法制得碲化氢,碲化氢在室温下分解后在聚乙烯塑料箔上沉积得到碲薄膜。
- TiO 2 thin films were prepared by chemical vapour deposition(CVD) with the source of tetra iso propyl titanate (Tiliso OC 3H 7) 4,TPT) and its optical properties are studied. 以四异丙醇钛（简称TPT）为钛源物质，采用常压化学气相沉积（CVD）法制备了TiO2膜，并对其光学性质进行了研究。
- C/C composites were prepared by needled felt with fibre volume fraction of 40%, 30% and 25% densifying through chemical vapour infiltration for three times. 摘要以40%25，30%25和25%253种不同纤维体积分数的针刺整体毡为坯体，经3次化学气相浸渗后制备C/C复合材料；
- New advance in chemical vapour deposition(CVD) , physical vapour deposition(PVD) .surfacemodification technology and other new technology in surface treatment were reviewed. 简要地评述了化学气相沉积(CVD)、物理气相沉积(PVD)、表面改性技术和其它表面处理技术的新进展。
- The two major techniques used are Chemical Vapour Deposition (CVD) and Physical Vapour Deposition (PVD).These can result in the deposition of two-dimensional blanket or patterned thin films. 因此本实验中将凹形及矩形之铜箔以叠加方式组合成一电极群，并藉由微细放电加工方法加工出具有数十道槽状的微细散热片。
- It is composed of pay-off stand, drawing machine, online continuous annealer, dual spooler or basket down coiler, electric control system, wire pointer &stripper, vapour generator. 机组由放线架，拉线主机，连续退火装置，双盘收线机或成圈下线机，电气控制系统，轧头穿模机，蒸汽发生器等组成。
- Cold vapour generation atomic absorption spectrometry 冷蒸气原子吸收光谱法
- Physical and chemical vapour deposition 物理、化学气相沉积
- chemical vapour deposition ( CVD ) 化学气相沉积法（CVD）
- chemical vapour deposition (CVD) 化学气相沉积
- thermally activated chemical vapour deposition 热活化化学气相沉积
- low pressure chemical vapour deposition 低压化学气相沉积
- tritiated water vapour generator system 氚气流发生器
